摘要:
A substrate for an electrooptical device includes a base 1 having a plurality of display dots D, an underlayer 4 formed on the base 1, a reflective layer 2 formed on the underlayer 4, and color layers 3r, 3g, and 3b formed on the reflective layer 2. The underlayer 4 is provided at regions corresponding to the display dots D, but is not provided at regions between the display dots D. In addition, concave areas are provided at regions between the display dots D, and a light-shielding layer 3k is provided to fill the concave areas. Accordingly, the light-shielding layer 3k, and the-color layers 3r, 3g, and 3b are level with each other.
摘要:
A substrate for an electrooptic device comprising a light-transmissive base member, a reflection layer formed on the base member so as to include each reflection portion and a corresponding transmission portion having a transmission factor higher than that of the reflection portion, a light transmission layer formed over the base member so as to coincide with the reflection layer and to include each hollow at a position that coincides with the transmission portion in plane, and an orientation film formed over the base member so as to coincide with the light transmission layer and to define a concavity while entering the corresponding hollow. The thickness “b” of a liquid crystal layer corresponding to the concavity is greater than the thickness “a” of the liquid crystal layer at the other positions thereof.
摘要:
A substrate for an electrooptic device comprising a light-transmissive base member, a reflection layer formed on the base member so as to include each reflection portion and a corresponding transmission portion having a transmission factor higher than that of the reflection portion, a light transmission layer formed over the base member so as to coincide with the reflection layer and to include each hollow at a position that coincides with the transmission portion in plane, and an orientation film formed over the base member so as to coincide with the light transmission layer and to define a concavity while entering the corresponding hollow. The thickness “b” of a liquid crystal layer corresponding to the concavity is greater than the thickness “a” of the liquid crystal layer at the other positions thereof.
摘要:
A substrate for an electrooptic device comprising a light-transmissive base member, a reflection layer formed on the base member so as to include each reflection portion and a corresponding transmission portion having a transmission factor higher than that of the reflection portion, a light transmission layer formed over the base member so as to coincide with the reflection layer and to include each hollow at a position that coincides with the transmission portion in plane, and an orientation film formed over the base member so as to coincide with the light transmission layer and to define a concavity while entering the corresponding hollow. The thickness “b” of a liquid crystal layer corresponding to the concavity is greater than the thickness “a” of the liquid crystal layer at the other positions thereof.
摘要:
A substrate for an electrooptic device comprising a light-transmissive base member, a reflection layer formed on the base member so as to include each reflection portion and a corresponding transmission portion having a transmission factor higher than that of the reflection portion, a light transmission layer formed over the base member so as to coincide with the reflection layer and to include each hollow at a position that coincides with the transmission portion in plane, and an orientation film formed over the base member so as to coincide with the light transmission layer and to define a concavity while entering the corresponding hollow. The thickness “b” of a liquid crystal layer corresponding to the concavity is greater than the thickness “a” of the liquid crystal layer at the other positions thereof.
摘要:
A substrate for an electrooptic device comprising a light-transmissive base member, a reflection layer formed on the base member so as to include each reflection portion and a corresponding transmission portion having a transmission factor higher than that of the reflection portion, a light transmission layer formed over the base member so as to coincide with the reflection layer and to include each hollow at a position that coincides with the transmission portion in plane, and an orientation film formed over the base member so as to coincide with the light transmission layer and to define a concavity while entering the corresponding hollow. The thickness “b” of a liquid crystal layer corresponding to the concavity is greater than the thickness “a” of the liquid crystal layer at the other positions thereof.
摘要:
A substrate for an electrooptic device comprising a light-transmissive base member, a reflection layer formed on the base member so as to include each reflection portion and a corresponding transmission portion having a transmission factor higher than that of the reflection portion, a light transmission layer formed over the base member so as to coincide with the reflection layer and to include each hollow at a position that coincides with the transmission portion in plane, and an orientation film formed over the base member so as to coincide with the light transmission layer and to define a concavity while entering the corresponding hollow. The thickness “b” of a liquid crystal layer corresponding to the concavity is greater than the thickness “a” of the liquid crystal layer at the other positions thereof.
摘要:
A photomask is used for an exposure process for roughening the surface of a process region of a film. The photomask includes a first region and a second region. The first region serves as a transmissive portion that transmits light traveling toward the periphery of the process region. The second region includes a plurality of dot regions each having a light-shielding portion for shielding the light traveling toward the process region and a semitransmissive portion that transmits the light traveling toward the process region in a region other than the dot regions, the semitransmissive portion transmitting the light at a lower transmittance than that of the transmissive portion.
摘要:
A manufacturing process of an electro-optical apparatus substrate is provided wherein a substrate is coated with a photosensitive resin. A first exposure process is executed with a first reticle to form an uneven portion on the substrate. Subsequently, a second exposure process is executed with a second reticle to remove all the photosensitive resin on portions other than the uneven portion. After the second exposure process, the substrate is developed so as to form an underlying film having an uneven portion.
摘要:
A manufacturing process of an electro-optical apparatus substrate is provided wherein a substrate is coated with a photosensitive resin. A first exposure process is executed with a first reticle to form an uneven portion on the substrate. Subsequently, a second exposure process is executed with a second reticle to remove all the photosensitive resin on portions other than the uneven portion. After the second exposure process, the substrate is developed so as to form an underlying film having an uneven portion.