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公开(公告)号：US20060260937A1
公开(公告)日：2006-11-23
申请号：US11134033
申请日：2005-05-20
申请人： Keith Miller , Genhua Xu , Shengde Zhong
发明人： Keith Miller , Genhua Xu , Shengde Zhong
CPC分类号： H01J37/3408 , B08B7/0035 , H01J37/321 , H01J37/32495
摘要： An antenna for coupling RF energy to a plasma in a process chamber having a wall comprises a coil having a face exposed to the plasma in the chamber. A plurality of standoffs support the coil at a set spacing from the wall of the process chamber, at least one standoff comprising a terminal thorough which electrical power is applied to the coil from an external power source. The terminal comprises a conductor receptacle having a first length L1 and a jacket around the conductor receptacle, the jacket having a second length L2. The length L1 is larger than the length L2. A conductor cup is provided about the standoff having the terminal.
摘要翻译： 用于将RF能量耦合到具有壁的处理室中的等离子体的天线包括具有暴露于腔室中的等离子体的面的线圈。 多个支座以距离处理室的壁一定距离的方式支撑线圈，至少一个支架包括端子，通过从外部电源向线圈施加电力的端子。 端子包括具有第一长度L 1的导体插座和围绕导体插座的护套，护套具有第二长度L 2。 长度L 1 <1>大于长度L 2 2。 围绕具有端子的支座设置导体杯。
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公开(公告)号：US08187416B2
公开(公告)日：2012-05-29
申请号：US11134033
申请日：2005-05-20
IPC分类号： C23C16/00 , H01L21/306
CPC分类号： H01J37/3408 , B08B7/0035 , H01J37/321 , H01J37/32495
摘要： An antenna for coupling RF energy to a plasma in a process chamber having a wall comprises a coil having a face exposed to the plasma in the chamber. A plurality of standoffs support the coil at a set spacing from the wall of the process chamber, at least one standoff comprising a terminal thorough which electrical power is applied to the coil from an external power source. The terminal comprises a conductor receptacle having a first length L1 and a jacket around the conductor receptacle, the jacket having a second length L2. The length L1 is larger than the length L2. A conductor cup is provided about the standoff having the terminal.
摘要翻译： 用于将RF能量耦合到具有壁的处理室中的等离子体的天线包括具有暴露于腔室中的等离子体的面的线圈。 多个支座以距离处理室的壁一定距离的方式支撑线圈，至少一个支架包括端子，通过从外部电源向线圈施加电力的端子。 端子包括具有第一长度L1的导体插座和围绕导体插座的护套，护套具有第二长度L2。 长度L1大于长度L2。 围绕具有端子的支座设置导体杯。
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公开(公告)号：US20120211358A1
公开(公告)日：2012-08-23
申请号：US13455084
申请日：2012-04-24
IPC分类号： C23C14/46
CPC分类号： H01J37/3408 , B08B7/0035 , H01J37/321 , H01J37/32495
摘要： An interior antenna is provided for coupling RF energy to a plasma in a process chamber having a wall. The antenna comprises a coil having a face exposed to the plasma in the process chamber. A plurality of standoffs are provided to support the coil at a spacing from the wall of the process chamber. At least one standoff comprises a terminal thorough which an electrical power can be applied to the coil, the terminal comprising a conductor receptacle. A conductor cup is around the standoff having the terminal. The conductor cup comprises a sidewall having an inner diameter that is sufficiently large to maintain a sidewall gap between the sidewall and the terminal.
摘要翻译： 提供内部天线用于将RF能量耦合到具有壁的处理室中的等离子体。 天线包括具有在处理室中暴露于等离子体的面的线圈。 提供多个支座以支撑与处理室的壁间隔的线圈。 至少一个间隔包括通过其可以向线圈施加电力的端子，该端子包括导体插座。 导线杯位于具有端子的支架的周围。 导体杯包括具有足够大的内径的侧壁，以保持侧壁和端子之间的侧壁间隙。
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