Wafer cleaning apparatus and structure for holding and transferring
wafer used in wafer cleaning apparatus
    1.
    发明授权
    Wafer cleaning apparatus and structure for holding and transferring wafer used in wafer cleaning apparatus 失效
    用于晶片清洗装置中使用的晶片保持和转移晶片的结构

    公开(公告)号:US6129100A

    公开(公告)日:2000-10-10

    申请号:US177939

    申请日:1998-10-23

    摘要: A transfer robot 2 for holding the peripheral edge of a wafer 1 and transferring the wafer 1, a turning-over alignment section 7 for turning over the wafer 1 and centering the wafer 1, and a transfer robot cleaning section 6 for cleaning holding portions 2a of the transfer robot 2 are provided. Besides, a wafer cleaning section 5 for cleaning the wafer 1 is provided and in this wafer cleaning section 5, a spinner 22 for chucking the wafer 1 and a nozzle 20 through which a cleaning liquid is jetted to this wafer 1. To this nozzle 20, a tank 11 for pure water for supplying pure water, a tank 12 for functional water for supplying a functional water, a tank 13 for chemical liquid for supplying a chemical liquid, and a cleaning liquid mixing portion 14 for storing these various kinds of cleaning liquids and mixing them are connected through supply lines.

    摘要翻译: 用于保持晶片1的周缘并传送晶片1的传送机器人2,用于翻转晶片1并使晶片1居中的翻转对准部7和用于清洁保持部2a的传送机器人清洁部6 提供传送机器人2。 此外,设置用于清洁晶片1的晶片清洁部分5,并且在该晶片清洁部分5中,用于夹持晶片1的旋转器22和喷射清洁液体的喷嘴20。向该喷嘴20 用于供应纯净水的纯水槽11,用于供应功能水的功能水的罐12,用于供给化学液体的药液用罐13以及用于储存这些各种清洗的清洗液混合部14 液体和混合物通过电源线连接。