摘要:
A transfer robot 2 for holding the peripheral edge of a wafer 1 and transferring the wafer 1, a turning-over alignment section 7 for turning over the wafer 1 and centering the wafer 1, and a transfer robot cleaning section 6 for cleaning holding portions 2a of the transfer robot 2 are provided. Besides, a wafer cleaning section 5 for cleaning the wafer 1 is provided and in this wafer cleaning section 5, a spinner 22 for chucking the wafer 1 and a nozzle 20 through which a cleaning liquid is jetted to this wafer 1. To this nozzle 20, a tank 11 for pure water for supplying pure water, a tank 12 for functional water for supplying a functional water, a tank 13 for chemical liquid for supplying a chemical liquid, and a cleaning liquid mixing portion 14 for storing these various kinds of cleaning liquids and mixing them are connected through supply lines.