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公开(公告)号:US11744081B1
公开(公告)日:2023-08-29
申请号:US17315139
申请日:2021-05-07
Applicant: Kepler Computing Inc.
Inventor: Niloy Mukherjee , Ramamoorthy Ramesh , Sasikanth Manipatruni , James Clarkson , FNU Atiquzzaman , Gabriel Antonio Paulius Velarde , Jason Y. Wu
Abstract: Described are ferroelectric device film stacks which include a templating or texturing layer or material deposited below a ferroelectric layer, to enable a crystal lattice of the subsequently deposited ferroelectric layer to template off this templating layer and provide a large degree of preferential orientation despite the lack of epitaxial substrates.
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公开(公告)号:US11716858B1
公开(公告)日:2023-08-01
申请号:US17315143
申请日:2021-05-07
Applicant: Kepler Computing Inc.
Inventor: Niloy Mukherjee , Ramamoorthy Ramesh , Sasikanth Manipatruni , James Clarkson , Fnu Atiquzzaman , Gabriel Antonio Paulius Velarde , Jason Y. Wu
IPC: H10B53/30 , H01L27/115 , H01L49/02
Abstract: Described are ferroelectric device film stacks which include a templating or texturing layer or material deposited below a ferroelectric layer, to enable a crystal lattice of the subsequently deposited ferroelectric layer to template off this templating layer and provide a large degree of preferential orientation despite the lack of epitaxial substrates.
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公开(公告)号:US11659714B1
公开(公告)日:2023-05-23
申请号:US17315111
申请日:2021-05-07
Applicant: Kepler Computing Inc.
Inventor: Niloy Mukherjee , Ramamoorthy Ramesh , Sasikanth Manipatruni , James Clarkson , FNU Atiquzzaman , Gabriel Antonio Paulius Velarde , Jason Y. Wu
IPC: H01L27/11507 , H01L27/11502 , H01L49/02 , H01L27/11597 , H01L27/11592 , H01L27/11587
CPC classification number: H01L27/11597 , H01L27/11502 , H01L27/11507 , H01L27/11587 , H01L27/11592 , H01L28/55 , H01L28/57 , H01L28/75
Abstract: Described are ferroelectric device film stacks which include a templating or texturing layer or material deposited below a ferroelectric layer, to enable a crystal lattice of the subsequently deposited ferroelectric layer to template off this templating layer and provide a large degree of preferential orientation despite the lack of epitaxial substrates.
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