公开(公告)号：US20230317632A1

公开(公告)日：2023-10-05

申请号：US17883690

申请日：2022-08-09

Applicant: Kioxia Corporation

Inventor： Mayuka OJIMA ,  Sachiyo ITO ,  Takuya KONNO

IPC: H01L23/00 ,  H01L23/58 ,  H01L27/11556 ,  H01L27/11582

CPC classification number: H01L23/562 ,  H01L23/564 ,  H01L23/585 ,  H01L27/11556 ,  H01L27/11582

Abstract: A semiconductor device according to an embodiment includes a substrate, a transistor, an insulating layer, and a first sealing portion. The substrate includes a first region, and a second region provided to surround an outer periphery of the first region. The transistor is provided on the substrate in the first region. The insulating layer is provided above the transistor and over the first region and the second region. The first sealing portion is provided to divide the insulating layer and surround the outer periphery of the first region in the second region. The first sealing portion includes a first void.