公开(公告)号：US20030124454A1

公开(公告)日：2003-07-03

申请号：US10039164

申请日：2002-01-03

Applicant: Kodak Polychrome Graphics LLC

Inventor： Celin Savariar-Hauck ,  Hans-Joachim Timpe

IPC: G03F007/038

CPC classification number: B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  G03F7/0382 ,  G03F7/203 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165

Abstract: A process for making thermally imageable negative working compositions comprising the steps of: (1) providing a patterning composition layer on a substrate, said patterning composition comprising: (a) at least one acid generator which is sensitive to UV radiation; (b) at least one cross-linking resin or compound; (c) at least one binder resin comprising a polymer containing at least one reactive pendent group consisting of hydroxyl, carboxylic acid, sulfonamide, alkoxymethylamide and mixtures thereof; and (d) at least one infrared absorber; (2) subjecting the patterning composition layer to a two-stage radiation exposure; (a) one stage being a flood UV-exposure; and (b) the other stage being a imagewise infrared exposure stage; (3) treating the exposed patterning composition with heat energy; and (4) developing the heat treated, exposed patterning composition with an aqueous alkaline developer to remove the non-imaged areas of the patterning composition and leaving the imaged areas substantially unaffected.

Abstract translation: 一种制备可热成像负性组合物的方法，包括以下步骤：（1）在基底上提供图案化组合物层，所述图案化组合物包含：（a）至少一种对UV辐射敏感的酸产生剂; （b）至少一种交联树脂或化合物; （c）至少一种粘合剂树脂，其包含含有至少一个由羟基，羧酸，磺酰胺，烷氧基甲基酰胺及其混合物组成的反应性侧基的聚合物; 和（d）至少一个红外线吸收剂; （2）对图案化组合物层进行两级辐射曝光; （a）一个阶段是泛滥紫外线曝光; 和（b）另一个阶段是成像红外曝光阶段; （3）用热能处理曝光的图案化组合物; 和（4）用含水碱性显影剂显影经热处理的曝光的图案化组合物以除去图案化组合物的非成像区域，并使成像区域基本上不受影响。