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    METHOD OF PRODUCING AN OPTICAL DEVICE
    1.
    发明申请
    METHOD OF PRODUCING AN OPTICAL DEVICE 审中-公开
    生产光学器件的方法

    公开(公告)号：US20110129659A1

    公开(公告)日：2011-06-02

    申请号：US12953841

    申请日：2010-11-24

    申请人： Koji Teranishi ,  Shinji Fukui ,  Keisui Banno

    发明人： Koji Teranishi ,  Shinji Fukui ,  Keisui Banno

    IPC分类号： B05D5/06 ,  B32B3/26

    CPC分类号： G02B1/113 ,  G02B1/12 ,  G02B2207/107 ,  Y10T428/24997

    摘要： An optical device that includes a low refractive index film is produced at a low cost. To attain this object, in a process of producing an optical device that includes a multilayer film in which low refractive index films and high refractive index films are alternately laminated, a porous film is formed on a substrate by a sputtering deposition system which uses a target unit. The porous film is immersed in a liquid to lower the refractive index of the film. By forming in simple steps a low refractive index film that is lower in refractive index than conventionally used films, a high quality optical device can be obtained at a low cost.

    摘要翻译： 以低成本制造包括低折射率膜的光学装置。 为了实现这个目的，在制造包括交替层叠有低折射率膜和高折射率膜的多层膜的光学器件的工艺中，通过使用靶材的溅射沉积系统在基板上形成多孔膜 单元。 将多孔膜浸入液体中以降低膜的折射率。 通过以简单的步骤形成折射率低于常规使用的膜的低折射率膜，可以以低成本获得高质量的光学器件。

    Method for manufacturing optical element
    3.
    发明授权
    Method for manufacturing optical element 有权
    光学元件制造方法

    公开(公告)号：US06835661B2

    公开(公告)日：2004-12-28

    申请号：US10448285

    申请日：2003-05-30

    申请人： Keisui Banno

    发明人： Keisui Banno

    IPC分类号： H01L21302

    CPC分类号： C30B33/00 ,  C30B29/12

    摘要： A method for manufacturing an optical element formed of CaF2 is provided, the optical element exhibiting a small optical loss even when being processed with plasma treatment such as sputtering or plasma cleaning. The method for manufacturing an optical element, described above, has the steps of polishing a CaF2 substrate and performing plasma treatment, such as sputtering or plasma cleaning, in a chamber in which the polished CaF2 substrate is placed. In the polishing step, the thickness of a process-altered layer formed on a surface of the CaF2 substrate is polished so as to be 30 nm or less, and hence there is provided a method for manufacturing an optical element capable of preventing degradation of the optical properties caused by plasma treatment.

    摘要翻译： 提供了一种用于制造由CaF 2形成的光学元件的方法，该光学元件即使在通过诸如溅射或等离子体清洁的等离子体处理进行处理时也表现出小的光损耗。 上述光学元件的制造方法具有如下步骤：在放置有抛光的CaF 2衬底的腔室中研磨CaF 2衬底并进行等离子体处理，例如溅射或等离子体清洗。 在抛光步骤中，将形成在CaF 2衬底的表面上的处理改变层的厚度抛光至30nm或更小，因此提供了一种制造能够防止劣化的光学元件的方法 等离子体处理引起的光学性能。

    Optical element and exposure apparatus
    4.
    发明授权
    Optical element and exposure apparatus 失效
    光学元件和曝光装置

    公开(公告)号：US08092929B2

    公开(公告)日：2012-01-10

    申请号：US12186138

    申请日：2008-08-05

    申请人： Keisui Banno

    发明人： Keisui Banno

    IPC分类号： B32B9/00 ,  G03B27/54 ,  G02B17/00

    CPC分类号： G02B13/143 ,  G02B13/24 ,  G03F7/70341 ,  G03F7/70941 ,  G03F7/70958 ,  Y10T428/261

    摘要： An optical element is configured to have a base composed of a LuAg substrate having a refractive index of 2.14±0.01 for a wavelength of 193 nm and an antireflection film formed on the base, and the optical element being configured to contact a liquid having a refractive index of 1.64±0.01 for the wavelength of 193 nm. The antireflection film includes a high refractive index layer that is formed on the base, contains Al2O3 having a refractive index of 1.87 to 1.92 for the wavelength of 193 nm, and has an optical film thickness of 0.21λ to 0.34λ for a design center wavelength λ of 193 nm and a low refractive index layer that is closer to the liquid than the high refractive index layer, contains Al2O3 having a refractive index equal to or smaller than 1.78 but larger than the refractive index of the liquid for the wavelength of 193 nm, and has an optical film thickness of 0.29λ to 0.52λ at the design center wavelength λ.

    摘要翻译： 光学元件被配置为具有由波长为193nm的折射率为2.14±0.01的LuAg基底和形成在基底上的抗反射膜构成的基底，并且该光学元件构造成接触具有折射率 对于波长193nm，指数为1.64±0.01。 防反射膜包括在基底上形成的高折射率层，对于193nm的波长包含折射率为1.87至​​1.92的Al 2 O 3，并且对于设计中心波长具有0.21λ至0.34λ的光学膜厚度 193nm的λ和比高折射率层更靠近液体的低折射率层包含折射率等于或小于1.78但大于193nm波长的液体的折射率的Al 2 O 3 并且在设计中心波长λ处具有0.29λ至0.52λ的光学膜厚度。

    OPTICAL ELEMENT AND EXPOSURE APPARATUS
    5.
    发明申请
    OPTICAL ELEMENT AND EXPOSURE APPARATUS 失效
    光学元件和曝光装置

    公开(公告)号：US20090061214A1

    公开(公告)日：2009-03-05

    申请号：US12186138

    申请日：2008-08-05

    申请人： Keisui Banno

    发明人： Keisui Banno

    IPC分类号： B32B7/00

    CPC分类号： G02B13/143 ,  G02B13/24 ,  G03F7/70341 ,  G03F7/70941 ,  G03F7/70958 ,  Y10T428/261

    摘要： An optical element is configured to have a base composed of a LuAg substrate having a refractive index of 2.14±0.01 for a wavelength of 193 nm and an antireflection film formed on the base, and the optical element being configured to contact a liquid having a refractive index of 1.64±0.01 for the wavelength of 193 nm. The antireflection film includes a high refractive index layer that is formed on the base, contains Al2O3 having a refractive index of 1.87 to 1.92 for the wavelength of 193 nm, and has an optical film thickness of 0.21λ to 0.34λ for a design center wavelength λ of 193 nm and a low refractive index layer that is closer to the liquid than the high refractive index layer, contains Al2O3 having a refractive index equal to or smaller than 1.78 but larger than the refractive index of the liquid for the wavelength of 193 nm, and has an optical film thickness of 0.29λ to 0.52λ at the design center wavelength λ.

    摘要翻译： 光学元件被配置为具有由波长为193nm的折射率为2.14±0.01的LuAg基底和形成在基底上的抗反射膜构成的基底，并且该光学元件构造成接触具有折射率 对于波长193nm，指数为1.64±0.01。 抗反射膜包括在基底上形成的高折射率层，对于193nm波长包含折射率为1.87至​​1.92的Al 2 O 3，并且对于设计中心波长具有0.21λ至0.34λ的光学膜厚度 193nm的λ和比高折射率层更靠近液体的低折射率层包含折射率等于或小于1.78但大于波长为193nm的液体的折射率的Al 2 O 3 并且在设计中心波长λ处具有0.29λ至0.52λ的光学膜厚度。