公开(公告)号：US20220111489A1

公开(公告)日：2022-04-14

申请号：US17420621

申请日：2019-12-24

Applicant: Konica Minolta, Inc.

Inventor： Keisuke MIZOGUCHI ,  Jing XUE ,  Fumiko TSUKIGATA ,  Akihiro MAEZAWA

IPC: B24B57/02 ,  C09G1/04 ,  B01D21/24

Abstract: A polishing agent regenerating method in which a component of a polished material is removed from polishing agent slurry and a polishing agent is collected and regenerated is shown. The method includes at least, polishing, polishing agent slurry supplying, polishing agent slurry collecting, and sedimenting/separating/concentrating, performed in the above order. In the polishing agent slurry collecting or the sedimenting/separating/concentrating, a K2O density in the polishing agent slurry after dilution by water is performed is to be within a range of 0.002-0.2 mass %.