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1.发明申请公开(公告)号：US20200268912A1
公开(公告)日：2020-08-27
申请号：US16761148
申请日：2018-10-19
Applicant: Yasuhiko TABATA , Konica Minolta, Inc.
Inventor： Chie INUI , Yasuhiko TABATA , Akihiro MAEZAWA , Makoto MOCHIZUKI , Natsumi HIRAYAMA
IPC: A61K49/18
Abstract: The purpose of the present invention is to provide composite particles for imaging that have high biodegradability after imaging. To achieve the above purpose, the composite particles for imaging according to the present invention are configured such that the ratio (long-term residual amount/short-term residual amount) of a long-term residual amount, which is the average value of the contrast rate after six days in a cell and the contrast rate after 11 days in a cell of the same type, and a short-term residual amount, which is the contrast rate after two days in a cell of the same type, is less than 99%.
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公开(公告)号：US20190002530A1
公开(公告)日：2019-01-03
申请号：US16064828
申请日：2016-12-19
Applicant: Konica Minolta, Inc.
Inventor： Chie INUI , Akihiro MAEZAWA , Yasuhiko TABATA
Abstract: Disclosed herein are gelatin particles including gelatin, wherein when a major-axis length of dried gelatin particles is defined as a and a major-axis length of gelatin particles after swelling treatment obtained by immersing the dried gelatin particles in water at 40° C. under an atmospheric pressure for 60 minutes is defined as b, swelling degree represented by b/a is 1.0 or more but 10.0 or less, and wherein the gelatin particles after swelling treatment have a particle diameter of 1.0 nm or more but 5.0 μm or less. The gelatin particles are easily taken up by cells themselves.
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公开(公告)号：US20200338218A1
公开(公告)日：2020-10-29
申请号：US16761138
申请日：2018-11-05
Applicant: Yasuhiko TABATA , Konica Minolta, Inc.
Inventor： Makoto MOCHIZUKI , Chie INUI , Natsumi HIRAYAMA , Akihiro MAEZAWA , Yasuhiko TABATA
Abstract: The present invention addresses the problem of providing: a hydrogel particle which can be taken into a cell by the action of the cell and can control the release of a magnetic particle enclosed therein into the cell so as to retain the magnetic particle in the cell for a long period; a method for producing the hydrogel particle; a cell or a cell structure each enclosing the hydrogel particle therein; and a method for evaluating the activity of a cell using the hydrogel particle. The present invention solves the problem by a hydrogel particle including: a domain which is composed of a first hydrogel; a matrix which encloses the domain and is composed of a second hydrogel having a different crosslinking degree or composition from that of the first hydrogel; and a magnetic particle which is supported by at least the first hydrogel.
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公开(公告)号：US20180339399A1
公开(公告)日：2018-11-29
申请号：US15775128
申请日：2016-12-01
Applicant: Konica Minolta, Inc.
Inventor： Chie INUI , Akihiro MAEZAWA , Yuuki NAGAI , Natsumi HIRAYAMA
IPC: B24B57/02
Abstract: An object of the present invention is to provide an abrasive slurry regeneration method capable of efficiently regenerating an abrasive slurry having a high polishing rate. The abrasive slurry regeneration method is an abrasive slurry regeneration method for polishing a polishing target containing silicon oxide as a main component using an abrasive slurry containing abrasive particles and a plurality of kinds of additives and then regenerating a collected abrasive slurry, characterized by including a regeneration step of collecting an additive having a molecular weight of 500 or more and an additive adsorbed by the abrasive particles among additives contained in the collected abrasive slurry together with the abrasive particles while an abrasive concentration (% by mass) is maintained within a range of 0.2 to 3000% with respect to an abrasive concentration (% by mass) of an unused abrasive slurry when being used for polishing a polishing target.
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5.发明申请Polishing Material Particles, Method For Producing Polishing Material, And Polishing Processing Method 有权抛光材料颗粒，抛光材料的制造方法和抛光加工方法公开(公告)号：US20160194538A1
公开(公告)日：2016-07-07
申请号：US14910986
申请日：2014-07-28
Applicant: KONICA MINOLTA, INC.
Inventor： Keisuke MIZOGUCHI , Akihiro MAEZAWA , Natsuki ITO , Atsushi TAKAHASHI , Hideaki WAKAMATSU , Yuuki NAGAI , Chie INUI
CPC classification number: C09K3/1409 , B24C11/00 , C01F17/0043 , C01P2004/03 , C01P2004/32 , C01P2004/52 , C01P2004/54 , C01P2004/61 , C01P2004/62 , C01P2004/64 , C09G1/02 , C09K3/1463
Abstract: Disclosed are polishing material particles which have polishing performance suitable for precision polishing and also have a high polishing speed and high monodispersibility; a polishing material containing the polishing material particles; and a polishing processing method using the polishing material. The polishing material particles are spherical particles having an average aspect ratio of 1.00 to 1.15, wherein the particle diameter (D50 (nm)) of the polishing material particles as determined from a particle diameter cumulative distribution curve falls within the range from 50 to 1500 nm. The average content of cerium or the total content of cerium and at least one element selected from lanthanum (La), praseodymium (Pr), neodymium (Nd), samarium (Sm) and europium (Eu) in the polishing material particles is 81 mol % or more relative to the total content of all of rare earth elements that constitute the polishing material particles.
Abstract translation: 公开了具有适合于精密抛光的抛光性能并且还具有高抛光速度和高单分散性的抛光材料颗粒; 包含抛光材料颗粒的抛光材料; 以及使用研磨材料的研磨处理方法。 抛光材料颗粒是平均纵横比为1.00至1.15的球形颗粒，其中由粒径累积分布曲线确定的抛光材料颗粒的粒径（D50（nm））落在50至1500nm的范围内 。 在研磨材料颗粒中，铈的平均含量或铈和至少一种选自镧（La），镨（Pr），钕（Nd），钐（Sm）和铕（Eu）的元素的含量为81mol 相对于构成抛光材料颗粒的所有稀土元素的总含量为％以上。
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Patent Agency Ranking
公开(公告)号：US20220356372A1
公开(公告)日：2022-11-10
申请号：US17658574
申请日：2022-04-08
Applicant: Konica Minolta, Inc.
Inventor： Atsushi TAKAHASHI , Akihiro MAEZAWA , Fumiko TSUKIGATA , Keisuke MIZOGUCHI
IPC: C09G1/02
Abstract: A recycled polishing agent slurry is prepared from a used polishing agent slurry after polishing a silicon material using a reference polishing agent slurry including a cerium oxide polishing agent and a dispersing agent. The preparation method includes: slurry collecting in which the used slurry discharged from a polishing machine is collected; separation and concentration in which the cerium oxide polishing agent in the collected slurry is separated from a component derived from the material to be polished and then concentrated, and polishing agent recycling in which a pH adjusting agent and the dispersing agent are added to the separated and concentrated cerium oxide polishing agent, and a recycled polishing agent slurry is adjusted to have a pH value at 25° C. of in a range of 6.0 to 10.5 and an electrical conductivity value in a range of 0.10 to 10.00 times that of the reference slurry.
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公开(公告)号：US20160194539A1
公开(公告)日：2016-07-07
申请号：US14911224
申请日：2014-07-25
Applicant: KONICA MINOLTA, INC.
Inventor： Yuuki NAGAI , Akihiro MAEZAWA , Chie INUI , Natsumi HIRAYAMA
CPC classification number: C09K3/1409 , C09G1/02 , C09K3/1463
Abstract: A polishing material comprising a polishing material particle including cerium, wherein, the polishing material particle is a secondary particle obtained by baking a primary particle which is a polishing material precursor particle; the primary particle is a sphere shape; an average particle size of the primary particle is within a range of 100 to 1000 nm; and an average particle size of the secondary particle is within a range of 300 to 10000 nm.
Abstract translation: 1.一种研磨材料，其特征在于，具备包括铈的研磨材料粒子，其中，所述研磨材料粒子是通过焙烧作为研磨材料前体粒子的一次粒子得到的二次粒子， 初级粒子是球形; 初级粒子的平均粒径在100〜1000nm的范围内; 二次粒子的平均粒径在300〜10000nm的范围内。
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公开(公告)号：US20150353795A1
公开(公告)日：2015-12-10
申请号：US14763070
申请日：2014-01-22
Applicant: KONICA MINOLTA, INC.
Inventor： Natsuki ITO , Akihiro MAEZAWA , Atsushi TAKAHASHI , Keisuke MIZOGUCHI , Chie INUI
IPC: C09K3/14
CPC classification number: C09K3/1445 , C01F17/0043 , C01P2002/60 , C01P2004/32 , C01P2004/62 , C01P2004/64 , C01P2004/80 , C01P2004/84 , C23C18/1216 , C23C18/1229
Abstract: An object of the present invention is to provide an inorganic core/shell particle to be contained in an abrasive material that contains a reduced amount of cerium, can polish harder workpieces at a high polishing rate, and can decrease the surface roughness of the workpieces. The inorganic core/shell particle P of the present invention is to be contained in an abrasive material and includes a core (1) containing a salt of at least one element selected from yttrium (Y), titanium (Ti), strontium (Sr), barium (Ba), samarium (Sm), europium (Eu), gadolinium (Gd), and terbium (Tb) and a shell (2) containing a salt of at least one element selected from these eight elements and a salt of cerium (Ce), wherein the crystallites in the shell (2) have an average diameter within a range of 4 to 30 nm.
Abstract translation: 本发明的目的在于提供一种含有少量铈的研磨材料的无机核/壳粒子，能够以高抛光速度对较硬的工件进行抛光，能够降低工件的表面粗糙度。 本发明的无机核/壳粒子P包含在研磨材料中，并且包括含有选自钇（Y），钛（Ti），锶（Sr） ，钡（Ba），钐（Sm），铕（Eu），钆（Gd）和铽（Tb）和含有选自这八元素中的至少一种元素的盐的壳（2） （Ce），其中壳（2）中的微晶的平均直径在4〜30nm的范围内。
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公开(公告)号：US20150306788A1
公开(公告)日：2015-10-29
申请号：US14379060
申请日：2013-02-14
Applicant: KONICA MINOLTA, INC.
Inventor： Yuuki NAGAI , Akihiro MAEZAWA , Atsushi TAKAHASHI
CPC classification number: B28D5/007 , B01D21/02 , B01D2221/14 , B24B57/00 , C02F11/14 , C02F2103/12 , Y02P70/179
Abstract: Technique to provide an abrasive regeneration method which, from a used abrasive, can recover an abrasive by an efficient method and can thereafter obtain a high-purity regenerated abrasive by a simple method. This abrasive regeneration method uses an abrasive comprising at least one type of abrasive selected from diamond, boron nitride, silicon carbide, alumina, alumina zirconia, zirconium oxide and cerium oxide. The abrasive regeneration involves a slurry recovery step (A) for recovering an abrasive slurry discharged from a polishing machine, a separation and concentration step (B) for adding an alkaline earth metal salt as an inorganic salt to the recovered abrasive slurry to aggregate the abrasive, and separating and concentrating the abrasive from a mother liquor, an abrasive recovery step (C) for recovering the separated and concentrated abrasive, and a second concentration step (D) for filter-treating the concentrated abrasive.
Abstract translation: 提供一种研磨再生方法，其从使用的研磨剂中可以通过有效的方法回收磨料，然后可以通过简单的方法获得高纯度再生磨料。 该磨料再生方法使用包含选自金刚石，氮化硼，碳化硅，氧化铝，氧化铝氧化锆，氧化锆和氧化铈中的至少一种类型的磨料的磨料。 研磨再生包括用于回收从抛光机排出的磨料浆料的浆料回收步骤（A），用于将回收的磨料浆料中的碱土金属盐作为无机盐添加到分离和浓缩步骤（B）中以将磨料 ，以及从母液中分离和浓缩研磨剂，用于回收分离和浓缩研磨剂的研磨回收步骤（C）和用于过滤处理浓缩磨料的第二浓缩步骤（D）。
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公开(公告)号：US20230191554A1
公开(公告)日：2023-06-22
申请号：US17921391
申请日：2021-04-12
Applicant: Konica Minolta, Inc.
Inventor： Atsushi TAKAHASHI , Akihiro MAEZAWA , Fumiko TSUKIGATA , Keisuke MIZOGUCHI
IPC: B24B37/013
CPC classification number: B24B37/013
Abstract: A polishing system performs chemical-mechanical polishing of an object to be polished using an abrasive slurry. The polishing system includes a polishing amount calculator that measures an amount of free metal ions of a metallic element derived from the object to be polished in a processed slurry and calculates a polishing amount of the object to be polished from the amount of the free metal ions. The object to be polished is a glass containing the metallic element of Group 1 or Group 2 of a periodic table.
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