公开(公告)号：US20060071180A1

公开(公告)日：2006-04-06

申请号：US11178597

申请日：2005-07-12

申请人： Konstantin Koshelev ,  Vladimir Ivanov ,  Evgenii Korob ,  Givi Zukavishvili ,  Robert Gayazov ,  Vladimir Krivtsun

发明人： Konstantin Koshelev ,  Vladimir Ivanov ,  Evgenii Korob ,  Givi Zukavishvili ,  Robert Gayazov ,  Vladimir Krivtsun

IPC分类号： A61N5/00 ,  G21G5/00

CPC分类号： H05G2/003 ,  H05G2/005

摘要： A device for generating radiation or a source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode of cathode or on a separate material located in between the anode and cathode.

摘要翻译： 基于放电产生辐射或源的装置包括阴极和阳极。 阴极和阳极材料以流体状态供应。 当设备使用时，该材料形成等离子体夹紧。 可选地，可以使用喷嘴来供应材料。 阴极和/或阳极可以形成平坦表面。 材料的轨迹可以是细长的。 可以使用激光器来使放电更容易。 激光可以被引导到阴极的阳极或位于阳极和阴极之间的单独的材料上。

公开(公告)号：US20060011864A1

公开(公告)日：2006-01-19

申请号：US10890381

申请日：2004-07-14

申请人： Konstantin Koshelev ,  Vladimir Ivanov ,  Evgenii Korob ,  Givi Zukavishvili ,  Robert Gayazov ,  Vladimir Krivtsun

发明人： Konstantin Koshelev ,  Vladimir Ivanov ,  Evgenii Korob ,  Givi Zukavishvili ,  Robert Gayazov ,  Vladimir Krivtsun

IPC分类号： H05G2/00 ,  G03F7/20

CPC分类号： H05G2/003 ,  H05G2/005

摘要： A device for generating radiation source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode of cathode or on a separate material located in between the anode and cathode.

摘要翻译： 基于放电产生辐射源的装置包括阴极和阳极。 阴极和阳极材料以流体状态供应。 当设备使用时，该材料形成等离子体夹紧。 可选地，可以使用喷嘴来供应材料。 阴极和/或阳极可以形成平坦表面。 材料的轨迹可以是细长的。 可以使用激光器来使放电更容易。 激光可以被引导到阴极的阳极或位于阳极和阴极之间的单独的材料上。

公开(公告)号：US20070001126A1

公开(公告)日：2007-01-04

申请号：US11170788

申请日：2005-06-30

申请人： Robert Gayazov ,  Vadim Banine ,  Vladimir Ivanov ,  Evgenii Korob ,  Konstantin Koshelev ,  Givi Zukavishvili ,  Yurii Sidelnikov

发明人： Robert Gayazov ,  Vadim Banine ,  Vladimir Ivanov ,  Evgenii Korob ,  Konstantin Koshelev ,  Givi Zukavishvili ,  Yurii Sidelnikov

IPC分类号： A61N5/00

CPC分类号： G03F7/70916

摘要： A foil trap is located in a path of a radiation beam. The foil trap includes an array of conductive strips. A voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips. The voltage application circuit includes a current limiting circuit arranged to limit currents to the strips to values below a threshold value above which self-sustained arc discharge may arise in the foil trap.

摘要翻译： 箔陷阱位于辐射束的路径中。 箔阱包括导电条的阵列。 电压施加电路耦合到条带以在相邻条带之间施加电压差。 电压施加电路包括限流电路，其被布置为将电流限制到条带以下的值到低于阈值的值，在该阈值以上可能在箔阱中产生自持电弧放电。

公开(公告)号：US20060219950A1

公开(公告)日：2006-10-05

申请号：US11094490

申请日：2005-03-31

申请人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Bastiaan Mertens ,  Johannes Moors ,  Frank Schuurmans ,  Givi Zukavishvili ,  Bastiaan Wolschrijn ,  Marc Van Der Velden

发明人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Bastiaan Mertens ,  Johannes Moors ,  Frank Schuurmans ,  Givi Zukavishvili ,  Bastiaan Wolschrijn ,  Marc Van Der Velden

IPC分类号： G03F7/20 ,  G21K5/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.

摘要翻译： 光刻设备被布置成将来自辐射源的光束投影到基底上。 该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合 到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

公开(公告)号：US20050253092A1

公开(公告)日：2005-11-17

申请号：US11187860

申请日：2005-07-25

申请人： Givi Zukavishvili ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Evgenil Korob ,  Vadim Banine ,  Pavel Antsiferov

发明人： Givi Zukavishvili ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Evgenil Korob ,  Vadim Banine ,  Pavel Antsiferov

IPC分类号： G21K5/00 ,  F28D15/02 ,  G03F7/20 ,  G21K5/02 ,  G21K5/08 ,  H01L21/027 ,  H05G2/00 ,  H05H1/24 ,  G03C5/00

CPC分类号： H05G2/003 ,  B82Y10/00 ,  F28D15/0266 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005

摘要： A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, lithium, tin or any suitable material. To improve conversion efficiency, the source unit may be constructed to have a low inductance, and operated with a minimum of plasma. To, for example, improve heat dissipation, a fluid circulation system can be created within the source volume and a wick by using a fluid in both its vapor and liquid states. To, for example, prevent contamination from entering a lithographic projection apparatus, the source unit can be constructed to minimize the production of contamination, and a trap can be employed to capture the contamination without interfering with the emitted radiation.

公开(公告)号：US20050140945A1

公开(公告)日：2005-06-30

申请号：US10748851

申请日：2003-12-31

申请人： Vadim Banine ,  Levinus Bakker ,  Vladimir Ivanov ,  Johannes Josephina Moors ,  Givi Zukavishvili ,  Abraham Veefkind

发明人： Vadim Banine ,  Levinus Bakker ,  Vladimir Ivanov ,  Johannes Josephina Moors ,  Givi Zukavishvili ,  Abraham Veefkind

IPC分类号： G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70983

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.

摘要翻译： 公开了一种光刻设备。 该装置包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统，以及减轻碎片颗粒的碎片减轻系统，该碎片减小系统在使用期间形成的碎屑颗粒的至少一部分 光刻设备 碎片减轻系统被布置成施加磁场，使得至少带电的碎屑颗粒被减轻。