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1.发明授权公开(公告)号：US11915627B2
公开(公告)日：2024-02-27
申请号：US16579231
申请日：2019-09-23
Inventor： Wontaek Seo , Yongkeun Park , Hoon Song , Jungkwuen An , Jongchan Park
IPC: G09G3/00 , G01S3/787 , H04N13/351 , G02B30/27 , H04N13/282
CPC classification number: G09G3/003 , G01S3/787 , G02B30/27 , H04N13/351 , H04N13/282
Abstract: A viewing angle expansion plate, which is a multi-pinhole mask, includes a plurality of cell areas; and a plurality of pinholes formed in the plurality of cell areas, wherein each cell area from among the plurality of cell areas corresponds to a respective pixel from among a plurality of pixels in a flat panel display. The flat panel display includes a light source configured to emit parallel light; a flat panel, on which the parallel light is incident, configured to provide a three-dimensional image; and the viewing angle expansion plate.
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公开(公告)号：US10852246B2
公开(公告)日：2020-12-01
申请号：US16305982
申请日：2017-06-01
Inventor： Young Dug Kim , Jongchan Park , Yongkeun Park
IPC: G01N21/95 , G01N21/47 , G02B26/12 , G01N21/956 , G02B27/48
Abstract: According to an aspect of the present invention, there is provided a pattern structure inspection method including irradiating a wave from a wave source onto a sample including a pattern region in which a structure having a certain pattern is provided on a substrate, collecting speckle data generated due to multiple scattering of the wave in the pattern region, by using a data collector, and analyzing whether the structure of the pattern region has a defect, by comparing the collected speckle data to reference speckle data.
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Patent Agency Ranking
公开(公告)号：US20200294442A1
公开(公告)日：2020-09-17
申请号：US16574856
申请日：2019-09-18
Inventor： Wontaek Seo , Yongkeun Park , Hoon Song , Jungkwuen An , Jongchan Park
Abstract: Provided are correction pattern obtaining apparatuses and methods of obtaining a correction pattern by using the correction pattern obtaining apparatuses. The correction pattern obtaining apparatus includes a flat panel display having an optical element that receives one or more input test patterns, a detector that measures intensity of light emitted from the flat panel display corresponding to each of the one or more input test patterns and a processor that determines a correction pattern comprising one or more of the one or more test patterns at a given ratio based on the measured intensity of light corresponding to each of the one or more input test patterns.
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4.发明公开公开(公告)号：US20240153416A1
公开(公告)日：2024-05-09
申请号：US18411804
申请日：2024-01-12
Inventor： Wontaek Seo , Yongkeun Park , Hoon Song , Jungkwuen An , Jongchan Park
IPC: G09G3/00 , G01S3/787 , G02B30/27 , H04N13/351
CPC classification number: G09G3/003 , G01S3/787 , G02B30/27 , H04N13/351 , H04N13/282
Abstract: A viewing angle expansion plate, which is a multi-pinhole mask, includes a plurality of cell areas; and a plurality of pinholes formed in the plurality of cell areas, wherein each cell area from among the plurality of cell areas corresponds to a respective pixel from among a plurality of pixels in a flat panel display. The flat panel display includes a light source configured to emit parallel light; a flat panel, on which the parallel light is incident, configured to provide a three-dimensional image; and the viewing angle expansion plate.
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公开(公告)号：US20180107157A1
公开(公告)日：2018-04-19
申请号：US15787560
申请日：2017-10-18
Inventor： YongKeun Park , Jongchan Park
CPC classification number: G03H1/04 , G02F1/01 , G03H1/02 , G03H1/202 , G03H2001/0204 , G03H2210/11 , G03H2210/12 , G03H2260/54
Abstract: Disclosed herein are a multifunctional optical element and method using multiple light scattering. An optical control method using multiple light scattering may include the steps of splitting coherent light into a signal beam and a reference beam, controlling the wavefront of the signal beam, forming an interference pattern by making the signal beam having the controlled wavefront and the reference beam incident on photorefractive materials, recording the interference pattern on the photorefractive materials, reconstructing the signal beam having the controlled wavefront by the interference pattern by radiating the reference beam to the photorefractive materials on which the interference pattern has been recorded again, and controlling the properties of light passing through complex media based on multiple light scattering generated by the complex media as the reconstructed signal beam is incident on the complex media.
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公开(公告)号：US11132935B2
公开(公告)日：2021-09-28
申请号：US16574856
申请日：2019-09-18
Inventor： Wontaek Seo , Yongkeun Park , Hoon Song , Jungkwuen An , Jongchan Park
Abstract: Provided are correction pattern obtaining apparatuses and methods of obtaining a correction pattern by using the correction pattern obtaining apparatuses. The correction pattern obtaining apparatus includes a flat panel display having an optical element that receives one or more input test patterns, a detector that measures intensity of light emitted from the flat panel display corresponding to each of the one or more input test patterns and a processor that determines a correction pattern comprising one or more of the one or more test patterns at a given ratio based on the measured intensity of light corresponding to each of the one or more input test patterns.
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7.发明申请公开(公告)号：US20200273388A1
公开(公告)日：2020-08-27
申请号：US16579231
申请日：2019-09-23
Inventor： Wontaek Seo , Yongkeun Park , Hoon Song , Jungkwuen An , Jongchan Park
IPC: G09G3/00 , G02B27/22 , H04N13/351 , G01S3/787
Abstract: A viewing angle expansion plate, which is a multi-pinhole mask, includes a plurality of cell areas; and a plurality of pinholes formed in the plurality of cell areas, wherein each cell area from among the plurality of cell areas corresponds to a respective pixel from among a plurality of pixels in a flat panel display. The flat panel display includes a light source configured to emit parallel light; a flat panel, on which the parallel light is incident, configured to provide a three-dimensional image; and the viewing angle expansion plate.
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