-
1.
公开(公告)号:US20040195105A1
公开(公告)日:2004-10-07
申请号:US10608678
申请日:2003-06-27
发明人: Jai-Moo Yoo , Young-Kuk Kim , Jae-Woong Ko , Kyu-Hwan Lee , Do-Yon Chang
IPC分类号: C25D005/00 , C25D003/56
摘要: Disclosed herein are a biaxially textured pure metal or alloy layer deposited by electroplating process on the surface of a single-crystalline or quasi-single-crystalline metal substrate, and a method for manufacturing the biaxially textured pure metal or alloy layer. Specifically, the biaxially textured pure metal or alloy layer is deposited by electroplating process on the surface of a pure metal or alloy substrate having single-crystalline or quasi-single-crystalline orientation. The biaxially textured pure metal or alloy layer has a misorientation on the c-axis of 4null or less and a misorientation on the plane formed by the a-axis and b-axis of 5.2null or less in which the misorientation on the c-axis is determined by a Full Width at Half Maximum of peaks on the null-rocking curve and the misorientation on the plane formed by the a-axis and b-axis is determined by a Full Width at Half Maximum of peaks on the null-scan. The biaxially textured pure metal and alloy layers can be manufactured simply by electroplating process without the need for additional processes. In addition, the biaxially textured layers fabricated according to method in the present invention exhibit excellent texture compared to those manufactured through conventional processes, and thus can be used as metal substrates for superconducting wires and thin film magnetic materials. Accordingly, they are expected to greatly contribute to the development of related industries.
摘要翻译: 本文公开了通过电镀方法在单晶或准单晶金属基板的表面上沉积的双轴织构的纯金属或合金层,以及用于制造双轴织构的纯金属或合金层的方法。 具体地说,将双轴织构的纯金属或合金层通过电镀工艺沉积在具有单晶或准单晶取向的纯金属或合金基底的表面上。 双轴织构化的纯金属或合金层在c轴上的取向差为4°以下,并且由a轴和b轴形成的平面上的定向偏差在5.2°以下,其中c- 轴由θ-摇摆曲线上的最大峰值处的全宽决定,并且由a轴和b轴形成的平面上的取向误差由Phi扫描上的最大峰值处的全宽确定 。 双轴纹理的纯金属和合金层可以简单地通过电镀工艺制造,而不需要额外的工艺。 此外,根据本发明的方法制造的双轴纹理层与通过常规方法制造的那些相比表现出优异的织构,因此可以用作超导线和薄膜磁性材料的金属基底。 因此,有望为相关产业的发展作出巨大贡献。