METHOD AND DEVICE FOR NANOIMPRINT LITHOGRAPHY
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    发明申请
    METHOD AND DEVICE FOR NANOIMPRINT LITHOGRAPHY 审中-公开
    NANOIMPRINT LITHOGRAPHY的方法和装置

    公开(公告)号:US20120292820A1

    公开(公告)日:2012-11-22

    申请号:US13501150

    申请日:2010-11-02

    IPC分类号: B29C59/02 B82Y30/00

    摘要: The invention relates to an imprinting device for imprinting nano/micro structures. The imprinting device comprises a second expandable cavity constituted in part by a membrane of the stamp. The membrane is flexible and formed in such a way so that when fluid is pumped into the expandable cavity then the membrane expands towards the imprintable substrate and imprints the substrate. The imprinting device is further provided with a force provider, alternatively a first expandable cavity, for forcing a contact part of the substrate to make contact with a matching contact part of the stamp.

    摘要翻译: 本发明涉及用于压印纳米/微结构的压印装置。 压印装置包括由印模的膜部分构成的第二可膨胀腔。 膜是柔性的并且以这样的方式形成,使得当流体被泵送到可膨胀腔中时,膜朝向可压印基底膨胀并且压印基底。 压印装置还设置有力提供者,或者第一可扩张腔,用于迫使衬底的接触部分与印模的匹配接触部分接触。