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公开(公告)号:US11642706B2
公开(公告)日:2023-05-09
申请号:US17168572
申请日:2021-02-05
Inventor: Qiangqiang Li , Baoyou Wang , Ce Chen , Gang Fang , Bolin Gan
Abstract: A cleaning device. The cleaning device includes: a base body, a spray head, and a main worktable and a first auxiliary worktable that are provided on the base body; a nozzle of the spray head is provided facing a mounting surface of the main worktable, and the spray head is configured to move in a preset direction vertical to the mounting surface to clean a to-be-cleaned panel on the mounting surface; the first auxiliary worktable is located at one end of the main worktable along the preset direction, and a first surface of the first auxiliary worktable facing the spray head is parallel to the mounting surface, and the first surface is higher than or flush with the mounting surface.
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公开(公告)号:US12071683B2
公开(公告)日:2024-08-27
申请号:US17537716
申请日:2021-11-30
Inventor: Haitao Chen , Qiangqiang Li , Bin Xue , Xiaogang Xin , Fei Sun , Zaifeng Qiu
IPC: H01L21/683 , C23C14/50
CPC classification number: C23C14/50 , H01L21/683 , Y10T29/5397
Abstract: The present disclosure relates to a clamping device configured to clamp a substrate. The clamping device includes a clamping plate and a flattening mechanism. The flattening mechanism includes at least one adjusting member configured to operably act on the clamping plate to apply a force to the clamping plate to flatten the clamping plate.
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