Polishing apparatus and method
    1.
    发明申请
    Polishing apparatus and method 审中-公开
    抛光设备和方法

    公开(公告)号:US20060205327A1

    公开(公告)日:2006-09-14

    申请号:US11369652

    申请日:2006-03-07

    IPC分类号: B24B7/30 B24B29/00

    CPC分类号: B24B13/01 B24B29/02

    摘要: The present invention provides a polishing apparatus and a polishing method, which are particular for the non-spherical lens. The polishing apparatus includes a base for carrying an object; and a polishing head, wherein the polishing head has a polishing layer made of a resin, a diamond and a graphite for polishing the object; a buffer layer connected to the polishing layer for the polishing head to tilt and shift; and a shaft connected to the buffer layer.

    摘要翻译: 本发明提供一种特别用于非球面透镜的抛光装置和抛光方法。 抛光装置包括用于承载物体的基座; 以及研磨头,其中所述抛光头具有由树脂制成的抛光层,用于抛光所述物体的金刚石和石墨; 连接到用于抛光头的抛光层倾斜和移位的缓冲层; 和连接到缓冲层的轴。