Gas turbine engine
    1.
    发明授权

    公开(公告)号:US11608778B2

    公开(公告)日:2023-03-21

    申请号:US16344556

    申请日:2017-10-24

    申请人: Kyle Jiang

    发明人: Kyle Jiang

    IPC分类号: F02C3/05 F02C3/14 F23R3/42

    摘要: A gas turbine engine (1) has a centrifugal compressor (4) and a radial turbine (14) mounted to a turbine shaft (2) for rotation with the shaft about the shaft axis Z. A number of combustion chambers (10) in the air/gas flow path between the compressor and the turbine are spaced circumferentially about the shaft axis. The combustion chambers (10) are elongate in the direction of air/gas flow and the longitudinal axis of each combustion chamber is skewed transversely relative to the axis Z of the turbine shaft. The combustion chambers (10) may be curved longitudinally about the shaft axis and may be aligned concentric about the axis. The engine may have a recuperator (8) radially outboard the compressor, the recuperator having radially directed flow passages through which air from the compressor is directed.

    Lithographic process
    2.
    发明授权
    Lithographic process 失效
    平版印刷工艺

    公开(公告)号:US07910292B2

    公开(公告)日:2011-03-22

    申请号:US10582033

    申请日:2004-12-01

    申请人: Kyle Jiang Peng Jin

    发明人: Kyle Jiang Peng Jin

    IPC分类号: G03F7/00

    CPC分类号: G03F7/2008 G03F7/20

    摘要: The present invention provides a lithographic process for producing high aspect ratio parts from an epoxy-type negative photoresist comprising the steps of: (i) irradiating a prebaked masked epoxy-type negative photoresist on a substrate with light at a total energy density of from 18,000 to 35,000 mJ/cm2, (ii) post-baking the exposed photoresist at elevated temperature, and (iii) developing the exposed photoresist in a solvent, wherein no more than 15% of the energy density is contributed by light having a wavelength of 400 nm or less. The invention also discloses a reciprocating microengine (10) comprising a cylinder (14), piston (12) and crankshaft made by the process.

    摘要翻译: 本发明提供了一种用于从环氧型负型光致抗蚀剂制造高纵横比部件的光刻工艺,其特征在于包括以下步骤:(i)在总能量密度为18,000的光照射基底上的预焙掩膜的环氧型负性光致抗蚀剂 (iii)在升高的温度下对曝光的光致抗蚀剂进行后烘烤,以及(iii)在溶剂中显影曝光的光致抗蚀剂,其中不超过15%的能量密度由波长为400的光 nm以下。 本发明还公开了一种往复式微发动机(10),其包括由该过程制成的气缸(14),活塞(12)和曲轴。

    Lithographic Process
    3.
    发明申请
    Lithographic Process 失效
    平版印刷工艺

    公开(公告)号:US20080241735A1

    公开(公告)日:2008-10-02

    申请号:US10582033

    申请日:2004-12-01

    申请人: Kyle Jiang Peng Jin

    发明人: Kyle Jiang Peng Jin

    IPC分类号: G03F7/038 G03F7/26

    CPC分类号: G03F7/2008 G03F7/20

    摘要: The present invention provides a lithographic process for producing high aspect ratio parts from an epoxy-type negative photoresist comprising the steps of: (i) irradiating a prebaked masked epoxy-type negative photoresist on a substrate with light at a total energy density of from 18,000 to 35,000 mJ/cm2, (ii) post-baking the exposed photoresist at elevated temperature, and (iii) developing the exposed photoresist in a solvent, wherein no more than 15% of the energy density is contributed by light having a wavelength of 400 nm or less. The invention also discloses a reciprocating microengine (10) comprising a cylinder (14), piston (12) and crankshaft made by the process.

    摘要翻译: 本发明提供了一种用于从环氧型负型光致抗蚀剂制造高纵横比部件的光刻工艺,其特征在于包括以下步骤:(i)在总能量密度为18,000的光照射基底上的预焙掩膜的环氧型负性光致抗蚀剂 (ii)在升高的温度下后曝光曝光的光致抗蚀剂,和(iii)在溶剂中显影暴露的光致抗蚀剂,其中不超过15%的能量密度为 由波长为400nm以下的光所贡献。 本发明还公开了一种往复式微发动机(10),其包括由该过程制成的气缸(14),活塞(12)和曲轴。