公开(公告)号：US20070071906A1

公开(公告)日：2007-03-29

申请号：US11536057

申请日：2006-09-28

申请人： Kyohei SEKI ,  Shinji SUZUKI ,  Yoichi MIZUKAWA

发明人： Kyohei SEKI ,  Shinji SUZUKI ,  Yoichi MIZUKAWA

IPC分类号： C23C14/00

CPC分类号： H01L21/67115

摘要： A light irradiation heating process in which, even in the case of an asymmetrical physical property of an article to be treated, uniform heating is possible, or in which heating can be performed such that the article acquires a desired physical property after heat treatment. Based on the measured value of the local physical property of the article to be treated, the emissivity distribution is obtained and the distribution pattern of the light intensity on the article to be treated is determined. According to this light intensity pattern, the individual intensity of the light emitted from respective light emitting parts of lamp units of the heating device are determined beforehand. According to this determined result, the intensity of the light emitted from the respective light emitting parts of the lamp units are controlled individually, and thus, the article to be treated is irradiated with light.

摘要翻译： 即使在待处理物品的不对称物理性质的情况下也可以进行均匀加热，或者可以进行加热，使得制品在热处理后获得所需的物理性质的光照射加热过程。 根据待处理物品的局部物理性质的测定值，得到辐射率分布，并确定待处理物品上光强度的分布格局。 根据该光强度图案，预先确定从加热装置的灯单元的各个发光部分发射的光的单独强度。 根据该确定结果，单独控制从灯单元的各个发光部分发射的光的强度，从而照射待处理的物品。

公开(公告)号：US20090116824A1

公开(公告)日：2009-05-07

申请号：US12264746

申请日：2008-11-04

申请人： Shinji SUZUKI ,  Kyohei SEKI

发明人： Shinji SUZUKI ,  Kyohei SEKI

IPC分类号： F26B3/28

CPC分类号： H05B3/0047 ,  H01L21/67115 ,  H05B2203/032

摘要： Light irradiation type heat treatment device composed of a plurality of lamps, including multi-filament lamps, the filaments of which can be independently supplied with power. The filaments are divided into a plurality of filament groups composed of filaments of one lamp put together with filaments of other lamps. Power control units are provided for each group, and drive units are provided corresponding to the power control units. The drive units adjust the electric power supplied from the power supply according to a command from the power control units to supply power to each filament belonging to the group. In a preferred arrangement, the plurality of lamps are arranged in parallel with at least one filament within each lamp having a length so as to form a concentric circle with filaments of other lamps arranged in parallel and the filaments forming the concentric circle are divided into a plurality of filament groups.

摘要翻译： 光照射型热处理装置，由多根灯组成，包括多根灯丝，灯丝可独立供电。 长丝被分成多个由灯组成的灯丝组，灯丝与其他灯的细丝放在一起。 为每个组提供功率控制单元，并且相应于功率控制单元提供驱动单元。 驱动单元根据来自功率控制单元的命令来调节从电源提供的电力，以向属于该组的每个灯丝供电。 在优选的布置中，多个灯与每个灯内的至少一根灯丝平行布置，具有长度，以便形成同心圆，其中其他灯的细丝平行布置，并且形成同心圆的长丝被分成 多个长丝组。

公开(公告)号：US20070120227A1

公开(公告)日：2007-05-31

申请号：US11565112

申请日：2006-11-30

申请人： Shinji SUZUKI ,  Kyohei SEKI

发明人： Shinji SUZUKI ,  Kyohei SEKI

IPC分类号： H01L23/544

CPC分类号： H05B3/0047 ,  H01L21/67115

摘要： To devise a heating device of the light irradiation type in which costs can reduced by reducing the number of filament lamps and current source parts without adversely affecting the illuminance distribution with respect to a wafer, in a heating device of the light irradiation type that has a light source part, in which several filament lamps are located parallel to one another, in which at least one of the filament lamps has several filaments which are located along the bulb axis are supplied with power individually to produce light which is irradiated from the light source parts onto an article to be treated, the distance between at least some of the adjacent filament lamps to one another is nonuniform.

摘要翻译： 为了设计光照射类型的加热装置，其中通过减少灯丝灯和电流源部件的数量而不会不利地影响相对于晶片的照度分布来降低成本，在具有 光源部分，其中几个白炽灯彼此平行地定位，其中至少一个灯丝灯具有沿着灯泡轴定位的几根灯丝被单独供应以产生从光源照射的光 部件到待处理的物品上，至少一些相邻的白炽灯彼此之间的距离是不均匀的。

公开(公告)号：US20090084992A1

公开(公告)日：2009-04-02

申请号：US12243341

申请日：2008-10-01

申请人： Tomonao HOSOKAI ,  Kazuhiko HORIOKA ,  Kyohei SEKI ,  Takuma YOKOYAMA

发明人： Tomonao HOSOKAI ,  Kazuhiko HORIOKA ,  Kyohei SEKI ,  Takuma YOKOYAMA

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/005

摘要： To achieve pulse-stretched EUV radiation without putting a large heat load on electrodes or requiring sophisticated control, a pulsed power is supplied between a first electrode and a second electrode provided inside a chamber to form a narrow discharge channel therebetween. A laser beam from a laser source irradiates high temperature plasma material to form low temperature plasma gas having an ion density of approximately 1017 to 1020 cm−3 which is supplied to a narrow discharge channel formed between the electrodes. Electric discharge acts on the low temperature plasma gas to raise the electron temperature, resulting in high temperature plasma. As a result, EUV radiation is produced. Since the low temperature plasma gas is continuously supplied to the discharge channel, the pinch effect or confining effect of its self-magnetic field is repeated, resulting in the continuation of EUV radiation.

摘要翻译： 为了实现脉冲拉伸EUV辐射而不在电极上施加大的热负荷或需要复杂的控制，在设置在室内的第一电极和第二电极之间提供脉冲功率，以在它们之间形成窄的放电通道。 来自激光源的激光束照射高温等离子体材料，形成离子密度约为1017〜1020cm-3的低温等离子体气体，该等离子体气体供给到在电极之间形成的狭窄的排出通道。 放电对低温等离子体气体起作用，提高电子温度，导致高温等离子体。 结果，产生了EUV辐射。 由于将低温等离子体气体连续地供给到排出通道，所以重复其自身磁场的夹紧效应或约束效应，导致EUV辐射的持续。

公开(公告)号：US20090127479A1

公开(公告)日：2009-05-21

申请号：US12253386

申请日：2008-10-17

申请人： Tomonao HOSOKAI ,  Kazuhiko HORIOKA ,  Kyohei SEKI ,  Hiroshi MIZOKOSHI

发明人： Tomonao HOSOKAI ,  Kazuhiko HORIOKA ,  Kyohei SEKI ,  Hiroshi MIZOKOSHI

IPC分类号： G01J3/10

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  H05G2/003

摘要： High temperature plasma raw material is added drop-wise, for example, and evaporated by irradiation with a laser beam. The laser beam passes through a discharge area between a pair of electrodes and irradiates the high temperature plasma raw material. Pulsed power is applied to the space between the electrodes in such a way that discharge current reaches a specified threshold value at a time when at least part of the evaporated material reaches the discharge channel. As a result, discharge starts between the electrodes, plasma is heated and excited and then EUV radiation is generated. The EUV radiation thus generated passes through a foil trap, is collected by EUV radiation collector optics and then extracted. The irradiation of the laser beam allows setting of the space density of the high temperature plasma raw material to a specified distribution and defining of the position of a discharge channel.

摘要翻译： 例如高温等离子体原料逐滴加入，用激光束照射蒸发。 激光束通过一对电极之间的放电区域并照射高温等离子体原料。 脉冲功率被施加到电极之间的空间，使得当至少部分蒸发的材料到达放电通道时，放电电流达到规定的阈值。 结果，在电极之间开始放电，等离子体被加热和激发，然后产生EUV辐射。 由此产生的EUV辐射通过箔陷阱，由EUV辐射收集器光学器件收集，然后提取。 激光束的照射允许将高温等离子体原料的空间密度设定为规定的分布并限定排出通道的位置。

公开(公告)号：US20070158594A1

公开(公告)日：2007-07-12

申请号：US11617163

申请日：2006-12-28

申请人： Takahiro SHIRAI ,  Kyohei SEKI

发明人： Takahiro SHIRAI ,  Kyohei SEKI

IPC分类号： G01J3/10

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G21K2201/065 ,  H05G2/003 ,  H05G2/005

摘要： An EUV radiation source device with a chamber that is divided into a discharge space and a collector mirror space provided with EUV collector optics 3a. Between them an aperture component with an opening which is cooled is provided. First and second discharge electrodes are rotated. Sn or Li is irradiated with laser . Pulsed power is applied between the first and second discharge electrodes to form a high density and high temperature plasma between the two electrodes so that EUV radiation with a wavelength of 13.5 nm is emitted, is focused by the EUV collector optics and is guided into the irradiation optical system of an exposure tool. There are a first pumping device and a second pumping device for pumping the discharge space and the collector mirror space. The discharge space is kept at a few Pa, and the collector mirror space is kept at a few 100 Pa.

摘要翻译： 具有腔室的EUV辐射源装置，其被分为放电空间和设置有EUV收集器光学器件3a的收集器反射镜空间。 在它们之间提供了具有被冷却的开口的孔部件。 旋转第一放电电极和第二放电电极。 用激光照射Sn或Li。 在第一和第二放电电极之间施加脉冲功率以在两个电极之间形成高密度和高温等离子体，从而发射波长为13.5nm的EUV辐射，由EUV收集器光学器件聚焦并被引导到辐照 曝光工具的光学系统。 存在用于泵送放电空间和收集器反射镜空间的第一泵送装置和第二泵送装置。 放电空间保持在几Pa，收集器反射镜空间保持在几百Pa。