Low-pressure discharge lamp
    1.
    发明授权

    公开(公告)号:US11024500B2

    公开(公告)日:2021-06-01

    申请号:US16313391

    申请日:2017-06-23

    Applicant: LEDVANCE GmbH

    Inventor: Armin Konrad

    Abstract: A low-pressure discharge lamp having a discharge vessel and a coating structure. The coating structure is formed on an inner side of the discharge vessel. The coating structure has nanoscale phosphate particles and/or nanoscale functional oxide. Alternatively or in addition, the phosphate particles are free or at least approximately free of rare earth metals. The nanoscale phosphate particles range in size from 5 nm to 800 nm.

    LED-based clean room lighting
    4.
    发明授权

    公开(公告)号:US10465878B2

    公开(公告)日:2019-11-05

    申请号:US15680783

    申请日:2017-08-18

    Applicant: LEDVANCE GmbH

    Abstract: A lighting device for room lighting in photolithography applications (in particular a retrofit lamp in sizes T5 and T8) comprises a light engine having a first light source which is configured to emit light in the wavelength range above approximately 500 nm and a second light source which is configured to emit light in a different wavelength range from the first light source. The first light source produces light in a spectral range within which photoresists used in photolithography are not sensitive. The second light source produces white light (either alone or in combination with the first light source).

    LED-BASED CLEAN ROOM LIGHTING
    5.
    发明申请

    公开(公告)号:US20180051864A1

    公开(公告)日:2018-02-22

    申请号:US15680783

    申请日:2017-08-18

    Applicant: LEDVANCE GmbH

    Abstract: A lighting device for room lighting in photolithography applications (in particular a retrofit lamp in sizes T5 and T8) comprises a light engine having a first light source which is configured to emit light in the wavelength range above approximately 500 nm and a second light source which is configured to emit light in a different wavelength range from the first light source. The first light source produces light in a spectral range within which photoresists used in photolithography are not sensitive. The second light source produces white light (either alone or in combination with the first light source).

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