公开(公告)号：US20030230727A1

公开(公告)日：2003-12-18

申请号：US10405500

申请日：2003-04-03

Applicant: LEICA MICROSYSTEMS LITHOGRAPHY LTD.

Inventor： John Tingay ,  Brian Raferty ,  Nigel Crosland

IPC: H01J037/141

CPC classification number: H01J37/141 ,  H01F5/02 ,  H01F7/202 ,  H01F27/22 ,  H01J37/147

Abstract: A device for influencing an electron beam, especially a deflector unit for an electron beam lithography machine, comprises a plurality of coil formers (12b) each with a bore (16) defining a passage for the beam and each carrying coils (18, 19) operable to generate magnetic fields for deflecting the path of the beam when passing through the passage. Each former is made of a high-strength ceramic material having a high thermal conductivity and low coefficient of thermal expansion so that, with respect to a given output of heat by the associated coils during quasi-continuous operation for repeated beam deflection during pattern writing, the heat is dissipated at such a rate as to preclude thermal expansion of the coils and thus avoid distortion of the magnetic fields generated by the coils.

Abstract translation: 用于影响电子束的装置，特别是用于电子束光刻机的偏转器单元，包括多个线圈形成器（12b），每个线圈形成器具有限定用于梁的通道的孔（16）和每个承载线圈（18,19） 可操作地产生用于在穿过通道时偏转梁的路径的磁场。 每个前者由具有高热导率和低热膨胀系数的高强度陶瓷材料制成，使得相对于相关线圈的给定输出的热量在用于模式写入期间的重复光束偏转的准连续操作期间， 热量以这样的速度消散，以防止线圈的热膨胀，从而避免由线圈产生的磁场的变形。