公开(公告)号：US20040061067A1

公开(公告)日：2004-04-01

申请号：US10631900

申请日：2003-08-01

Applicant: LEO Elecktronenmikroskopie GmbH

Inventor： Wilfried Clauss

IPC: H01J037/141

CPC classification number: H01J37/1475

Abstract: A particle-optical apparatus is proposed as well as a method for operating the same. The particle-optical apparatus provides a magnetic field for deflecting charged particles of a beam of charged particles and comprises a body of a material with a permeability number around which a current conductor at least partially engages and a temperature-adjusting unit -for adjusting a temperature of the magnetic-flux-carrying body substantially to a nominal temperature. A relative variation of the permeability number relative to a width of a temperature range is to be smaller than a limit value a, wherein a is preferably smaller than 3null10null3Knull1. In particular, the nominal temperature is at an extremum of a temperature dependence of the permeability number. Preferably, such a particle-optical apparatus can be employed in a microscopy or a lithography apparatus.

Abstract translation: 提出了一种粒子光学装置及其操作方法。 颗粒光学装置提供用于偏转带电粒子束的带电粒子的磁场，并且包括具有至少部分接合的电流导体周围的渗透性数量的材料体和用于调节温度的温度调节单元 的磁通量载体基本上达到标称温度。 渗透率数据相对于温度范围的宽度的相对变化应小于极限值a，其中a优选小于3.10 -3 K -1。 特别地，标称温度是导磁率值的温度依赖性的极值。 优选地，这样的粒子光学装置可以用在显微镜或光刻设备中。

公开(公告)号：US20020104969A1

公开(公告)日：2002-08-08

申请号：US10113002

申请日：2002-03-28

Inventor： Zhong-Wei Chen

IPC: H01J037/141

CPC classification number: H01J37/28 ,  H01J37/141 ,  H01J2237/04756 ,  H01J2237/1035

Abstract: A swinging objective retarding immersion lens system and method therefore which provide a low voltage electron beam with high beam current, relatively high spatial resolution, a relative large scan field, and high signal collection efficiency. The objective lens includes a magnetic lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, an electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen; a deflection system including a plurality of deflection units situated along the beam axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the magnetic lens; and a annular detection unit with a relatively small aperture, located underneath the primary beam define aperture, to capture secondary electron (SE) and backscattered electrons (BSE).

Abstract translation: 一种摆动物镜延迟浸没透镜系统及其方法，其提供具有高光束电流的低电压电子束，相对高的空间分辨率，相对大的扫描场和高的信号收集效率。 物镜包括用于在样本附近产生磁场以将粒子束的粒子聚焦在样本上的磁性透镜，具有向样本附近的粒子束提供延迟场的电位的电极，以减少 当光束与样品碰撞时，粒子束的能量; 偏转系统包括沿着光束轴线设置的多个偏转单元，用于偏转粒子束以允许对具有大面积的样本进行扫描，位于光束的延迟场中的至少一个偏转单元，偏转的剩余部分 位于磁性透镜的中心孔内的单元; 和具有相对较小孔径的环形检测单元，位于主光束下方限定孔，以捕获二次电子（SE）和反向散射电子（BSE）。

公开(公告)号：US20030230727A1

公开(公告)日：2003-12-18

申请号：US10405500

申请日：2003-04-03

Applicant: LEICA MICROSYSTEMS LITHOGRAPHY LTD.

Inventor： John Tingay ,  Brian Raferty ,  Nigel Crosland

IPC: H01J037/141

CPC classification number: H01J37/141 ,  H01F5/02 ,  H01F7/202 ,  H01F27/22 ,  H01J37/147

Abstract: A device for influencing an electron beam, especially a deflector unit for an electron beam lithography machine, comprises a plurality of coil formers (12b) each with a bore (16) defining a passage for the beam and each carrying coils (18, 19) operable to generate magnetic fields for deflecting the path of the beam when passing through the passage. Each former is made of a high-strength ceramic material having a high thermal conductivity and low coefficient of thermal expansion so that, with respect to a given output of heat by the associated coils during quasi-continuous operation for repeated beam deflection during pattern writing, the heat is dissipated at such a rate as to preclude thermal expansion of the coils and thus avoid distortion of the magnetic fields generated by the coils.

Abstract translation: 用于影响电子束的装置，特别是用于电子束光刻机的偏转器单元，包括多个线圈形成器（12b），每个线圈形成器具有限定用于梁的通道的孔（16）和每个承载线圈（18,19） 可操作地产生用于在穿过通道时偏转梁的路径的磁场。 每个前者由具有高热导率和低热膨胀系数的高强度陶瓷材料制成，使得相对于相关线圈的给定输出的热量在用于模式写入期间的重复光束偏转的准连续操作期间， 热量以这样的速度消散，以防止线圈的热膨胀，从而避免由线圈产生的磁场的变形。

公开(公告)号：US20030209674A1

公开(公告)日：2003-11-13

申请号：US10431782

申请日：2003-05-08

Applicant: ADVANTEST CORPORATION ,  CANON KABUSHIKI KAISHA ,  Hitachi, Ltd.

Inventor： Shinichi Hamaguchi ,  Susumu Goto ,  Osamu Kamimura ,  Yasunari Sohda

IPC: G21K001/093 ,  G21K005/00 ,  H01J003/22 ,  H01J037/141

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G21K1/093 ,  H01J37/153 ,  H01J37/3177 ,  H01J2237/1536

Abstract: An electron beam exposure apparatus for exposing wafer with an electron beam, includes: the first electromagnetic lens system for making the electron beam incident substantially perpendicularly on the first plane be incident on the second plane substantially perpendicularly; the second electromagnetic lens system for making the electron beam that was substantially perpendicularly incident on the second plane be incident on the wafer substantially perpendicularly; a rotation correction lens for correcting rotation of the electron beam caused by the first electromagnetic lens system and/or the second electromagnetic lens system; a deflection system for deflecting the electron beam to a position on the wafer, that is to be irradiated with the electron beam; and a deflection-correction optical system for correcting deflection aberration caused by the deflection system.

Abstract translation: 一种用电子束曝光晶片的电子束曝光装置，包括：用于使基本上垂直于第一平面的电子束入射的第一电磁透镜系统基本垂直入射在第二平面上; 用于使基本上垂直入射在第二平面上的电子束的第二电磁透镜系统基本垂直入射在晶片上; 用于校正由第一电磁透镜系统和/或第二电磁透镜系统引起的电子束旋转的旋转校正透镜; 偏转系统，用于将电子束偏转到晶片上被电子束照射的位置; 以及用于校正由偏转系统引起的偏转像差的偏转校正光学系统。

公开(公告)号：US20030189176A1

公开(公告)日：2003-10-09

申请号：US10276104

申请日：2002-11-12

Inventor： Boris Chichkov ,  Andr?eacute; Egbert

IPC: H01J037/141 ,  G21G005/00 ,  G01J001/00

CPC classification number: H05G2/003

Abstract: The invention relates to a method for generating EUV radiation. Laser pulses are directed onto photoelectric transducer means (10), which generate pulses of electrically charged particles (6) as a result of the action of the laser pulses. The electrically charged particles are accelerated in an electric field and directed onto a target (4), in such a way that the target generates a plasma, which emits EUV radiation, as a result of the action of the electrically charged particles.

Abstract translation: 本发明涉及一种用于产生EUV辐射的方法。 激光脉冲被引导到由激光脉冲的作用产生的产生带电粒子（6）的脉冲的光电转换器装置（10）上。 电荷粒子在电场中被加速并被引导到目标（4）上，使得由于带电粒子的作用，目标产生发射EUV辐射的等离子体。