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公开(公告)号：US11624982B2
公开(公告)日：2023-04-11
申请号：US16631985
申请日：2018-11-09
申请人： LG CHEM, LTD.
发明人： Seung Yeon Hwang , Dai Seung Choi , Min Hyung Lee , Dongmin Jeong
IPC分类号： G03F7/037 , G03F7/038 , G03F7/023 , G03F7/38 , G03F7/40 , G03F7/039 , G03F7/16 , G03F7/20 , G03F7/32
摘要： A photosensitive resin composition including a polyamide-imide resin having a specific structure, a film comprising a cured product of the photosensitive resin composition, a method for preparing the film and a method for forming a resist pattern using the photosensitive resin composition.
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公开(公告)号：US10131843B2
公开(公告)日：2018-11-20
申请号：US15519982
申请日：2015-12-17
申请人： LG Chem, Ltd.
发明人： Eun Seok Park , Jung Ha Park , Dai Seung Choi , Seung Yeon Hwang , Min Hyung Lee
IPC分类号： C09K19/56 , C08F232/08 , C08F32/08 , C08J5/18 , C08L45/00 , G02F1/1337 , C08G61/08
摘要： The present invention relates to a vertical alignment layer including a cyclic olefin copolymer, and more specifically, the present invention relates to a vertical alignment layer capable of having alignment even in a low temperature process, and exhibiting excellent liquid crystal vertical alignment by including a cyclic olefin copolymer having a specific substituent.
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公开(公告)号：US20170349834A1
公开(公告)日：2017-12-07
申请号：US15519982
申请日：2015-12-17
申请人： LG Chem, Ltd.
发明人： Eun Seok Park , Jung Ha Park , Dai Seung Choi , Seung Yeon Hwang , Min Hyung Lee
IPC分类号： C09K19/56 , C08F232/08 , G02F1/1337
CPC分类号： C09K19/56 , C08F32/08 , C08F232/08 , C08G61/08 , C08G2261/11 , C08G2261/122 , C08G2261/1426 , C08G2261/146 , C08G2261/148 , C08G2261/3324 , C08G2261/418 , C08J5/18 , C08L45/00 , G02F1/1337 , G02F1/133711 , G02F2001/133742
摘要： The present invention relates to a vertical alignment layer including a cyclic olefin copolymer, and more specifically, the present invention relates to a vertical alignment layer capable of having alignment even in a low temperature process, and exhibiting excellent liquid crystal vertical alignment by including a cyclic olefin copolymer having a specific substituent.
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公开(公告)号：US09366907B2
公开(公告)日：2016-06-14
申请号：US14426950
申请日：2013-09-10
申请人： LG CHEM, LTD.
发明人： Hyeong Bin Jang , Sung-Ho Chun , Dong Woo Yoo , Seung Yeon Hwang
IPC分类号： C08F2/46 , C08F2/50 , C08G61/04 , G02F1/1337 , C09D179/08 , C08G73/10 , C08L45/00 , C09K19/56
CPC分类号： G02F1/133711 , C08G73/10 , C08L45/00 , C09D179/08 , C09K19/56 , G02F1/1337 , G02F1/133788 , C08L79/08
摘要： This invention relates to a composition for a photo-alignment layer which can exhibit superior thermal stability, alignability, and alignment rate, and can also suppress generation of an afterimage and further improve a voltage holding ratio when applied to a liquid crystal cell, and to a photo-alignment layer and a liquid crystal alignment layer using the same. The composition for a photo-alignment layer includes a cyclic olefin-based photo-alignment polymer and a polyamic acid ester-based photo-alignment additive.
摘要翻译： 本发明涉及一种光取向层用组合物，其可以表现出优异的热稳定性，取向性和取向速度，并且还可以抑制残留物的产生，并且当施加到液晶单元时进一步提高电压保持率，以及 光取向层和使用其的液晶取向层。 用于光取向层的组合物包括环状烯烃类光取向聚合物和聚酰胺酸酯类光取向添加剂。
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公开(公告)号：US20150241737A1
公开(公告)日：2015-08-27
申请号：US14426950
申请日：2013-09-10
申请人： LG CHEM, LTD.
发明人： Hyeong Bin Jang , Sung-Ho Chun , Dong Woo Yoo , Seung Yeon Hwang
IPC分类号： G02F1/1337
CPC分类号： G02F1/133711 , C08G73/10 , C08L45/00 , C09D179/08 , C09K19/56 , G02F1/1337 , G02F1/133788 , C08L79/08
摘要： This invention relates to a composition for a photo-alignment layer which can exhibit superior thermal stability, alignability, and alignment rate, and can also suppress generation of an afterimage and further improve a voltage holding ratio when applied to a liquid crystal cell, and to a photo-alignment layer and a liquid crystal alignment layer using the same. The composition for a photo-alignment layer includes a cyclic olefin-based photo-alignment polymer and a polyamic acid ester-based photo-alignment additive.
摘要翻译： 本发明涉及一种能够表现出优异的热稳定性，对准性和取向速度的光取向层组合物，并且还可以抑制残留物的产生，并且当施加到液晶单元时进一步提高电压保持率，以及 光取向层和使用其的液晶取向层。 用于光取向层的组合物包括环状烯烃类光取向聚合物和聚酰胺酸酯类光取向添加剂。
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