公开(公告)号：US11124660B2

公开(公告)日：2021-09-21

申请号：US16488053

申请日：2018-09-20

Applicant: LG CHEM, LTD.

Inventor： Hyeok Jeong ,  Taekeun Kim ,  Jinkyu Lee ,  Mingoo Kim

IPC: C08G77/38 ,  C09D5/14 ,  C09D7/40 ,  C08J5/18 ,  C08K5/00 ,  C08K5/3415 ,  C08L63/00 ,  C09D183/04

Abstract: An antimicrobial polymer coating composition comprising a polyhedral oligomeric silsesquioxane having a cage structure and having one or more reactive functional groups substituted on silicon atoms; a thermal initiator; and a photosensitizer, an antimicrobial polymer film comprising a cured product of the antimicrobial polymer coating composition, and an antimicrobial polymer film comprising: a substrate layer containing a polyhedral oligomeric silsesquioxane having a cage structure, in which one or more reactive functional groups are substituted; and a photosensitizes dispersed in the substrate layer, wherein the polymer film has oxygen permeability of 10 to 80 cc/m2 day.