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公开(公告)号:US20180348704A1
公开(公告)日:2018-12-06
申请号:US16058834
申请日:2018-08-08
Applicant: LG Display Co., Ltd. , Bayer MaterialScience AG
Inventor: Hyungseok BANG , Heejin IM , Guensik LEE , Friedrich-Karl BRUDER , Thomas Peter FACKE , Marc-Stephan WEISER , Rainer HAGEN , Thomas ROLLE , Horst BERNETH , Dennis HONEL , Günther WALZE
CPC classification number: G03H1/0402 , G02B5/32 , G03H1/0252 , G03H1/0272 , G03H1/04 , G03H1/0486 , G03H2001/026 , G03H2001/0264 , G03H2001/043 , G03H2001/0439 , G03H2240/43 , G03H2240/52 , G03H2240/55 , G03H2270/11
Abstract: The invention relates to a method for producing a holographic optical element by providing a recording stack comprising at least one recording element laminated on at least one supporting element, irradiating at least a part of the recording stack with at least one recording beam in an irradiating step, wherein during the irradiating step, the recording stack bends, providing a bending deviation threshold for the recording stack, and adjusting at least one first process parameter such that an expected maximum bending deviation of the recording stack does not exceed the bending deviation threshold, wherein the at least one first process parameter influences the bending behaviour of the recording stack during the irradiating step.
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公开(公告)号:US20160313696A1
公开(公告)日:2016-10-27
申请号:US14695610
申请日:2015-04-24
Applicant: LG Display Co., Ltd. , Bayer MaterialScience AG
Inventor: Hyungseok BANG , Heejin IM , Guensik LEE , Friedrich-Karl BRUDER , Thomas Peter FACKE , Marc-Stephan WEISER , Rainer HAGEN , Thomas ROLLE , Horst BERNETH , Dennis HONEL , Günther WALZE
CPC classification number: G03H1/0402 , G02B5/32 , G03H1/0252 , G03H1/0272 , G03H1/04 , G03H1/0486 , G03H2001/026 , G03H2001/0264 , G03H2001/043 , G03H2001/0439 , G03H2240/43 , G03H2240/52 , G03H2240/55 , G03H2270/11
Abstract: The invention relates to a method for producing a holographic optical element by providing a recording stack comprising at least one recording element laminated on at least one supporting element, irradiating at least a part of the recording stack with at least one recording beam in an irradiating step, wherein during the irradiating step, the recording stack bends, providing a bending deviation threshold for the recording stack, and adjusting at least one first process parameter such that an expected maximum bending deviation of the recording stack does not exceed the bending deviation threshold, wherein the at least one first process parameter influences the bending behaviour of the recording stack during the irradiating step.
Abstract translation: 本发明涉及一种制造全息光学元件的方法,该方法通过提供一种包括至少一个层压在至少一个支撑元件上的记录元件的记录堆叠,在照射步骤中用至少一个记录光束照射至少一部分记录叠层 ,其中在所述照射步骤期间,所述记录堆叠弯曲,为所述记录堆叠提供弯曲偏差阈值,以及调整至少一个第一工艺参数,使得所述记录堆叠的预期最大弯曲偏差不超过所述弯曲偏差阈值,其中 该至少一个第一工艺参数在照射步骤期间影响记录堆叠的弯曲行为。
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