摘要:
The present disclosure relates to a thin film type controlled viewing window back light unit and a thin flat type Controlled Viewing window Display using the same. The present disclosure suggests a thin film type back light unit which can include: a base film having a width and a length, and including a high refractive film and a low refractive film stacked on the high refractive film; an incident pattern disposed at one side of a bottom surface of the base film; a reflective pattern disposed at an opposite side apart from the one side with the length of the bottom surface of the base film, and covering the width of the opposite side; a light radiating pattern disposed on an upper surface of the base film; a holographic film for controlling a viewing-window disposed on the light radiating pattern; and a light source being apart from the incident pattern, and providing an incident light to the incident pattern.
摘要:
The invention relates to a method for producing a holographic optical element by providing a recording stack comprising at least one recording element laminated on at least one supporting element, irradiating at least a part of the recording stack with at least one recording beam in an irradiating step, wherein during the irradiating step, the recording stack bends, providing a bending deviation threshold for the recording stack, and adjusting at least one first process parameter such that an expected maximum bending deviation of the recording stack does not exceed the bending deviation threshold, wherein the at least one first process parameter influences the bending behaviour of the recording stack during the irradiating step.
摘要:
The invention relates to a method for producing a holographic optical element by providing a recording stack comprising at least one recording element laminated on at least one supporting element, irradiating at least a part of the recording stack with at least one recording beam in an irradiating step, wherein during the irradiating step, the recording stack bends, providing a bending deviation threshold for the recording stack, and adjusting at least one first process parameter such that an expected maximum bending deviation of the recording stack does not exceed the bending deviation threshold, wherein the at least one first process parameter influences the bending behaviour of the recording stack during the irradiating step.