公开(公告)号：US20030144162A1

公开(公告)日：2003-07-31

申请号：US10267047

申请日：2002-10-09

Applicant: LG.PHILIPS LCD CO., LTD.

Inventor： Gee-Sung Chae ,  Yong-Sup Hwang ,  Cyoo-Chul Jo ,  Oh-Nam Kwon ,  Kyoung-Mook Lee ,  Byung-Uk Kim ,  Sang-Dai Lee ,  Jong-Soon Yoo

IPC: C11D001/00

CPC classification number: C11D11/0047 ,  C11D7/263 ,  C11D7/3218 ,  C11D7/3263 ,  C11D7/3281 ,  C11D7/5013 ,  G03F7/425 ,  Y10S134/902

Abstract: A composition for removing a copper-compatible resist includes about 10% to about 30% by weight of an amine compound, about 10% to about 80% by weight of a glycolether compound, and about 10% to about 80% by weight of a polar solvent.

Abstract translation: 用于除去铜相容抗蚀剂的组合物包括约10％至约30％重量的胺化合物，约10％至约80％重量的乙二醇醚化合物和约10％至约80％重量的 极性溶剂。