公开(公告)号：US20030124851A1

公开(公告)日：2003-07-03

申请号：US10331726

申请日：2002-12-31

Applicant: LG.Philips LCD Co., Ltd.

Inventor： Gyoo-Chul Jo ,  Gee-Sung Chae ,  Yong-Sup Hwang ,  Oh-Nam Kwon ,  Kyoung-Mook Lee ,  Kui-Jong Baek ,  Tai-Hyung Rhee

IPC: H01L021/00 ,  H01L021/302

CPC classification number: H01L21/32134 ,  C23F1/18 ,  C23F1/26 ,  Y10S436/80

Abstract: An etching solution for etching one of a copper single metal layer and a copper (Cu)/titanium (Ti) double metal layer that serves as one of a gate electrode, a source electrode, and a drain electrode of a thin film transistor for a liquid crystal display (LCD) device includes oxone, fluoric compounds, one of a reducing agent and a weak oxidizing agent, an etching rate restrainer, KHF2, and water.

Abstract translation: 一种蚀刻溶液，用于蚀刻用作薄膜晶体管的栅电极，源电极和漏电极之一的铜单金属层和铜（Cu）/钛（Ti）双金属层之一， 液晶显示器（LCD）装置包括牛酮，氟化合物，还原剂和弱氧化剂之一，蚀刻速率抑制剂，KHF 2和水。

公开(公告)号：US20030144162A1

公开(公告)日：2003-07-31

申请号：US10267047

申请日：2002-10-09

Applicant: LG.PHILIPS LCD CO., LTD.

Inventor： Gee-Sung Chae ,  Yong-Sup Hwang ,  Cyoo-Chul Jo ,  Oh-Nam Kwon ,  Kyoung-Mook Lee ,  Byung-Uk Kim ,  Sang-Dai Lee ,  Jong-Soon Yoo

IPC: C11D001/00

CPC classification number: C11D11/0047 ,  C11D7/263 ,  C11D7/3218 ,  C11D7/3263 ,  C11D7/3281 ,  C11D7/5013 ,  G03F7/425 ,  Y10S134/902

Abstract: A composition for removing a copper-compatible resist includes about 10% to about 30% by weight of an amine compound, about 10% to about 80% by weight of a glycolether compound, and about 10% to about 80% by weight of a polar solvent.

Abstract translation: 用于除去铜相容抗蚀剂的组合物包括约10％至约30％重量的胺化合物，约10％至约80％重量的乙二醇醚化合物和约10％至约80％重量的 极性溶剂。