Thin film transistor array substrate and method of fabricating the same
    1.
    发明申请
    Thin film transistor array substrate and method of fabricating the same 有权
    薄膜晶体管阵列基板及其制造方法

    公开(公告)号:US20040222421A1

    公开(公告)日:2004-11-11

    申请号:US10833185

    申请日:2004-04-28

    Abstract: A thin film transistor array substrate includes a gate line formed on a substrate, a data line formed on the substrate intersecting with the gate line to define a pixel region, a thin film transistor formed at the intersection of the gate line and the data line, the thin film transistor including gate electrode formed on the substrate, a gate insulating layer formed on the gate electrode and the substrate, a semiconductor layer formed on the gate insulating layer, an ohmic contact layer on the semiconductor layer, and a source electrode and a drain electrode on the ohmic contact layer, and a transparent electrode material within the pixel region and connected to the drain electrode of the thin film transistor, wherein the gate insulating layer includes a gate insulating pattern underlying the data line and the transparent electrode material, and covering the gate line.

    Abstract translation: 薄膜晶体管阵列基板包括形成在基板上的栅极线,形成在与栅极线交叉以限定像素区域的基板上的数据线,形成在栅极线和数据线的交叉处的薄膜晶体管, 所述薄膜晶体管包括形成在所述基板上的栅极电极,形成在所述栅极电极和所述基板上的栅极绝缘层,形成在所述栅极绝缘层上的半导体层,所述半导体层上的欧姆接触层以及源电极和 漏极电极和像素区域内的透明电极材料,并连接到薄膜晶体管的漏电极,其中栅极绝缘层包括位于数据线下方的栅绝缘图案和透明电极材料,以及 覆盖门线。

Patent Agency Ranking