公开(公告)号：US20230393456A1

公开(公告)日：2023-12-07

申请号：US18231000

申请日：2023-08-07

Applicant: LINTEC OF AMERICA, INC.

Inventor： Marcio D. LIMA ,  Takahiro UEDA

IPC: G03F1/22 ,  G03F1/64 ,  G03F7/00

CPC classification number: G03F1/22 ,  G03F1/64 ,  G03F7/70983

Abstract: A filtration formed nanostructure pellicle film is disclosed. The filtration formed nanostructure pellicle film includes a plurality of carbon nanofibers that are intersected randomly to form an interconnected network structure in a planar orientation. The interconnected structure allows for a high minimum EUV transmission rate of at least 92%, with a thickness ranging from a lower limit of 3 nm to an upper limit of 100 nm, to allow for effective EUV lithography processing.

公开(公告)号：US20240419062A1

公开(公告)日：2024-12-19

申请号：US18816681

申请日：2024-08-27

Applicant: LINTEC OF AMERICA, INC.

Inventor： Marcio D. LIMA ,  Takahiro UEDA

IPC: G03F1/22 ,  G03F1/64 ,  G03F7/00

Abstract: A filtration formed nanostructure pellicle film is disclosed. The filtration formed nanostructure pellicle film includes a plurality of carbon nanofibers that are intersected randomly to form an interconnected network structure in a planar orientation. The interconnected structure allows for a high minimum EUV transmission rate of at least 92%, with a thickness ranging from a lower limit of 3 nm to an upper limit of 100 nm, to allow for effective EUV lithography processing.

公开(公告)号：US20190136094A1

公开(公告)日：2019-05-09

申请号：US16096610

申请日：2017-04-28

Applicant: LINTEC CORPORATION ,  LINTEC OF AMERICA, INC.

Inventor： Takahiro UEDA ,  Masaharu ITO ,  Kanzan INOUE

IPC: C09J7/29 ,  C01B32/168 ,  C09J7/38 ,  C09J9/02

Abstract: L1 is a maximum distance across a non-contacting section between intersection points of a straight line crossing the non-contacting section in parallel with an alignment direction of a carbon nanotubes in a plan view of a mounting section with a border between the non-contacting section and a contacting section. L2 is a maximum distance across the non-contacting section between intersection points of a straight line crossing the non-contacting section and intersecting the alignment direction of the carbon nanotubes in the plan view of the mounting section with the border between the non-contacting section and the contacting section. When L1 is larger than L2, at least L2 is more than 0 mm and less than 10 mm. When smaller, at least L1 is more than 0 mm and less than 10 mm. When equal, L1 and L2 are each more than 0 mm and less than 10 mm.

公开(公告)号：US20230341764A1

公开(公告)日：2023-10-26

申请号：US18026722

申请日：2021-09-16

Applicant: LINTEC OF AMERICA, INC.

Inventor： Marcio D. LIMA ,  Takahiro UEDA

IPC: G03F1/64

CPC classification number: G03F1/64

Abstract: An apparatus and method are described herein for providing tension to carbon nanotube films. An apparatus and method are described herein for transferring carbon nanotube films from a first frame to a second frame. An example method includes deforming a frame by one of a thermal method or a physical method, allowing the frame to return to an original shape, and providing tension to the carbon nanotube film.

公开(公告)号：US20250004363A1

公开(公告)日：2025-01-02

申请号：US18695930

申请日：2022-09-27

Applicant: LINTEC OF AMERICA, INC.

Inventor： Marcio D. LIMA ,  Mary Viola GRAHAM ,  Takahiro UEDA

IPC: G03F1/64 ,  B82Y30/00

Abstract: A filtration formed nanostructure pellicle film with an ultra-thin zirconium coating is disclosed. The filtration formed nanostructure pellicle film includes a plurality of nanotubes that are intersected randomly to form an interconnected network structure in a planar orientation with enhanced properties, and a zirconium-coated layer. The coated interconnected structure with the zirconium-coated layer allows for a high minimum EUV transmission rate of at least 88%. The interconnected network structure has a thickness ranging from a lower limit of 3 nm to an upper limit of 100 nm, to allow for effective EUV lithography processing.

公开(公告)号：US20240385508A1

公开(公告)日：2024-11-21

申请号：US18695933

申请日：2022-09-27

Applicant: LINTEC OF AMERICA, INC.

Inventor： Marcio D. LIMA ,  Takahiro UEDA

IPC: G03F1/62

Abstract: A filtration formed nanostructure pellicle film is disclosed. The filtration formed nanostructure pellicle film includes a plurality of carbon nanofibers that are intersected randomly to form an interconnected network structure in a planar orientation with enhanced properties by plasma treatment. The interconnected structure allows for a high minimum EUV transmission rate of at least 92%, with a thickness ranging from a lower limit of 3 nm to an upper limit of 100 nm, to allow for effective EUV lithography processing.

公开(公告)号：US20230095318A1

公开(公告)日：2023-03-30

申请号：US18074082

申请日：2022-12-02

Applicant: LINTEC OF AMERICA, INC.

Inventor： Marcio D. LIMA ,  Takahiro UEDA

IPC: G03F1/22 ,  G03F1/64 ,  G03F7/20

Abstract: A filtration formed nanostructure pellicle film is disclosed. The filtration formed nanostructure pellicle film includes a plurality of carbon nanofibers that are intersected randomly to form an interconnected network structure in a planar orientation. The interconnected structure allows for a high minimum EUV transmission rate of at least 92%, with a thickness ranging from a lower limit of 3 nm to an upper limit of 100 nm, to allow for effective EUV lithography processing.