公开(公告)号：US20190271081A1

公开(公告)日：2019-09-05

申请号：US16410057

申请日：2019-05-13

申请人： Lam Research Corporation

发明人： Chunguang XIA ,  Ramesh Chandrasekharan ,  Douglas Keil ,  Edward J. Augustyniak ,  Karl Frederick Leeser

IPC分类号： C23C16/455 ,  H01J37/32 ,  C23C16/509 ,  C23C16/44

摘要： A method for operating a substrate processing system includes delivering precursor gas to a chamber using a showerhead that includes a head portion and a stem portion. The head portion includes an upper surface, a sidewall, a lower planar surface, and a cylindrical cavity and extends radially outwardly from one end of the stem portion towards sidewalls of the chamber. The showerhead is connected, using a collar, to an upper surface of the chamber. The collar is arranged around the stem portion. Process gas is flowed into the cylindrical cavity via the stem portion and through a plurality of holes in the lower planar surface to distribute the process gas into the chamber. A purge gas is supplied through slots of the collar into a cavity defined between the head portion and an upper surface of the chamber.