公开(公告)号：US20160141153A1

公开(公告)日：2016-05-19

申请号：US15003485

申请日：2016-01-21

Applicant: Lam Research Corporation

Inventor： Armen Avoyan ,  Cliff la Croix ,  Hong Shih

IPC: H01J37/32 ,  B08B3/02

CPC classification number: H01J37/32862 ,  B08B3/00 ,  B08B3/02 ,  H01J21/00 ,  H01J37/32532 ,  H01L21/00

Abstract: In one embodiment, a dual phase cleaning chamber may include a turbulent mixing chamber, a fluid diffuser, an isostatic pressure chamber and a rupture mitigating nozzle. The turbulent mixing chamber may be in fluid communication with a first fluid inlet and a second fluid inlet. The fluid diffuser may be in fluid communication with the turbulent mixing chamber. The rupture mitigating nozzle may include a first fluid collecting offset, a second fluid collecting offset, and a displacement damping projection. The displacement damping projection may be disposed between the first and second fluid collecting offset and may be offset away from each of the first fluid collecting offset and the second fluid collecting offset, and towards the fluid diffuser. A pressurized cleaning fluid introduced from the first fluid inlet, the second fluid inlet, or both flows through the outlet passage of the first and second fluid collecting offset.

Abstract translation: 在一个实施例中，双相清洗室可以包括湍流混合室，流体扩散器，等静压压力室和破裂缓冲喷嘴。 湍流混合室可以与第一流体入口和第二流体入口流体连通。 流体扩散器可以与湍流混合室流体连通。 破裂缓冲喷嘴可以包括第一流体收集偏移，第二流体收集偏移和位移阻尼突起。 位移阻尼突起可以设置在第一和第二流体收集偏移之间，并且可以偏离第一流体收集偏移和第二流体收集偏移中的每一个并且朝向流体扩散器偏移。 从第一流体入口，第二流体入口或二者引入的加压清洁流体流过第一和第二流体收集偏移的出口通道。