公开(公告)号：US20140096834A1

公开(公告)日：2014-04-10

申请号：US14096508

申请日：2013-12-04

Applicant: Lam Research Corporation

Inventor： Damien Slevin ,  Brad Laird ,  Curtis Bailey ,  Ming Li ,  Sirish Reddy ,  James Sims ,  Mohamed Sabri ,  Saangrut Sangplug

IPC: C23C16/455

CPC classification number: C23C16/45589 ,  C23C16/4402 ,  C23C16/4486 ,  C23C16/45561 ,  Y10T137/0318

Abstract: A method for supplying vapor to a chamber includes providing a first diverter valve that, when open, diverts vapor away from the chamber, and a second diverter valve that, when open, supplies the vapor to the chamber; supplying a carrier gas to the chamber; after supplying the carrier gas, creating plasma in the chamber while a substrate is in the chamber; opening the first diverter valve and closing the second diverter valve; supplying the vapor by vaporizing at least one liquid precursor in a carrier gas; after a first predetermined period sufficient for the vapor to reach steady-state flow, closing the first diverter valve and opening the second diverter valve to supply the vapor to the chamber; and after a second predetermined period following the first predetermined period, opening the first diverter valve and closing the second diverter valve to stop supplying the vapor to the chamber.

Abstract translation: 一种向腔室供应蒸汽的方法包括：提供一个第一分流阀，当打开时将蒸气转移出离开室，第二分流阀在打开时将蒸汽供应到室; 向所述室供应载气; 在供应载气之后，在基板在腔室中时在腔室中产生等离子体; 打开第一分流阀并关闭第二分流阀; 通过在载气中汽化至少一种液体前体来供应蒸气; 在足以使蒸气达到稳态流动的第一预定时间段之后，关闭第一分流阀并打开第二分流阀以将蒸汽供应到室; 并且在所述第一预定时段之后的第二预定时段之后，打开所述第一分流阀并关闭所述第二分流阀以停止向所述室供应蒸汽。

公开(公告)号：US09637821B2

公开(公告)日：2017-05-02

申请号：US14096508

申请日：2013-12-04

Applicant: Lam Research Corporation

Inventor： Damien Slevin ,  Brad Laird ,  Curtis Bailey ,  Ming Li ,  Sirish Reddy ,  James Sims ,  Mohamed Sabri ,  Saangrut Sangplug

IPC: C23C16/455 ,  C23C16/448 ,  C23C16/44

CPC classification number: C23C16/45589 ,  C23C16/4402 ,  C23C16/4486 ,  C23C16/45561 ,  Y10T137/0318

Abstract: A method for supplying vapor to a chamber includes providing a first diverter valve that, when open, diverts vapor away from the chamber, and a second diverter valve that, when open, supplies the vapor to the chamber; supplying a carrier gas to the chamber; after supplying the carrier gas, creating plasma in the chamber while a substrate is in the chamber; opening the first diverter valve and closing the second diverter valve; supplying the vapor by vaporizing at least one liquid precursor in a carrier gas; after a first predetermined period sufficient for the vapor to reach steady-state flow, closing the first diverter valve and opening the second diverter valve to supply the vapor to the chamber; and after a second predetermined period following the first predetermined period, opening the first diverter valve and closing the second diverter valve to stop supplying the vapor to the chamber.