专利检索 ap:("Lam Research Corporation") AND inv:"Nizan Kenane" 第 1 页

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发明申请
POSITIVE TONE DEVELOPMENT OF CVD EUV RESIST FILMS 有权

公开(公告)号：US20220299877A1

公开(公告)日：2022-09-22

申请号：US17753110

申请日：2020-10-08

申请人： Lam Research Corporation

发明人： Timothy William Weidman , Katie Lynn Nardi , Dries Dictus , Benjamin Kam , Chenghao Wu , Eric Calvin Hansen , Nizan Kenane , Kevin Li Gu

IPC分类号： G03F7/16 , G03F7/20 , G03F7/039

摘要： The present disclosure relates to post-application treatment of a radiation-sensitive film to provide a hardened resist film. In some instances, such films can be used to form a pattern by a positive tone wet development process.