公开(公告)号：US10262910B2

公开(公告)日：2019-04-16

申请号：US15389451

申请日：2016-12-23

Applicant: Lam Research Corporation

Inventor： Ye Feng ,  Prashanth Kumar ,  Andrew D. Bailey, III

IPC: H01L21/66 ,  H01L21/67 ,  H01J37/32

Abstract: Methods and systems for using a time-series of spectra to identify endpoint of an etch process. One method includes accessing a virtual carpet that is formed from a time-series of spectra for the etch process collected during a training operation. And, running a fabrication etch process on a fabrication wafer, such that while the fabrication etch process is performed portions of a carpet defined from a time-series of spectral is generated for the fabrication etch process. Then, comparing the portions of the carpet of the fabrication etch process to the virtual carpet. End pointing is processed for the fabrication etch process when said comparing indicates that a desired metric has been reached for the fabrication wafer. In one example, said portions of the carpet include a current frame of captured spectra and at least one previous frame of captured spectra. The portions of the carpet of the fabrication etch process are fitted to the virtual carpet to identify a virtual frame number and associated floating parameters that are used in a correlation to predicted a value for the metric. Further, each of the carpets produced during the training operation and the virtual carpet are defined by a polynomial. The coefficients of the carpets produced during the training operation are a subset of the coefficients of the polynomial of the virtual carpet.

公开(公告)号：US20190244870A1

公开(公告)日：2019-08-08

申请号：US16386234

申请日：2019-04-16

Applicant: Lam Research Corporation

Inventor： Ye Feng ,  Prashanth Kumar ,  Andrew D. Bailey, III

IPC: H01L21/66 ,  H01J37/32 ,  H01L21/67

CPC classification number: H01L22/26 ,  H01J37/32926 ,  H01J37/32963 ,  H01J37/32972 ,  H01L21/67259 ,  H01L22/00 ,  H01L22/12 ,  H01L22/24

Abstract: Methods and systems for using a time-series of spectra to identify endpoint of an etch process. One method includes accessing a virtual carpet that is generated from a time-series of spectra for an etch process. A polynomial with coefficients represents the virtual carpet. The method includes processing a fabrication etch process on a fabrication wafer and generating a carpet defined from a time-series of spectra while processing the fabrication etch process. While the processing the fabrication etch process and generating the carpet, comparing portions of the carpet and the virtual carpet to identify an endpoint metric of the fabrication etch process.

公开(公告)号：US20180182632A1

公开(公告)日：2018-06-28

申请号：US15389451

申请日：2016-12-23

Applicant: Lam Research Corporation

Inventor： Ye Feng ,  Prashanth Kumar ,  Andrew D. Bailey, III

IPC: H01L21/3065 ,  H01L21/66

CPC classification number: H01L22/26 ,  H01J37/32926 ,  H01J37/32963 ,  H01J37/32972 ,  H01L21/67259 ,  H01L22/00 ,  H01L22/12 ,  H01L22/24

Abstract: Methods and systems for using a time-series of spectra to identify endpoint of an etch process. One method includes accessing a virtual carpet that is formed from a time-series of spectra for the etch process collected during a training operation. And, running a fabrication etch process on a fabrication wafer, such that while the fabrication etch process is performed portions of a carpet defined from a time-series of spectral is generated for the fabrication etch process. Then, comparing the portions of the carpet of the fabrication etch process to the virtual carpet. End pointing is processed for the fabrication etch process when said comparing indicates that a desired metric has been reached for the fabrication wafer. In one example, said portions of the carpet include a current frame of captured spectra and at least one previous frame of captured spectra. The portions of the carpet of the fabrication etch process are fitted to the virtual carpet to identify a virtual frame number and associated floating parameters that are used in a correlation to predicted a value for the metric. Further, each of the carpets produced during the training operation and the virtual carpet are defined by a polynomial. The coefficients of the carpets produced during the training operation are a subset of the coefficients of the polynomial of the virtual carpet.

公开(公告)号：US20170047202A1

公开(公告)日：2017-02-16

申请号：US14823977

申请日：2015-08-11

Applicant: Lam Research Corporation

Inventor： Prashanth Kumar

IPC: H01J37/32 ,  H01L21/67

CPC classification number: H01J37/32339 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/3266

Abstract: An apparatus, for treating a substrate in a plasma processing chamber with an electromagnet power source with leads. An edge ring body surrounds the substrate. An electromagnet is embedded within or attached to a surface of the edge ring body, extending more than half way around the edge ring, wherein the electromagnet is configured to provide a magnetic flux greater than 0.1 mTesla along more than half of an outer edge of the substrate, wherein the electromagnet comprises at least one winding, wherein the leads of the electromagnet power source are electrically connected to the at least one winding.

Abstract translation: 一种用于利用具有引线的电磁体电源处理等离子体处理室中的衬底的装置。 边缘环体围绕基底。 电磁体被嵌入或附接到边缘环体的表面，其延伸超过边缘环的一半以上，其中电磁体被配置为沿着超过一半的外边缘提供大于0.1mTesla的磁通量 衬底，其中所述电磁体包括至少一个绕组，其中所述电磁体电源的引线电连接到所述至少一个绕组。