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公开(公告)号:US11639031B2
公开(公告)日:2023-05-02
申请号:US15930822
申请日:2020-05-13
发明人: Maxim Shusteff , James Oakdale , Robert Matthew Panas , Christopher M. Spadaccini , Hayden K. Taylor , Brett Kelly , Indrasen Bhattacharya , Hossein Heidari
IPC分类号: B29C64/393 , C08F2/50 , B29C64/153 , B29C64/232 , B33Y50/02 , B33Y30/00 , C08F20/18 , B33Y10/00 , B29K33/00 , B33Y70/10 , B33Y40/20 , B29C64/268 , B29C64/282 , B29C64/264 , B29C64/124 , B29C64/277 , B29C64/241 , B29C64/386 , B29C64/106
摘要: Methods and materials for volumetric additive manufacturing, including computed axial lithography (“CAL”), using photosensitive resins comprising a photocurable resin prepolymer; a photoinitiator; and (optionally) a curing inhibitor. In various embodiments, such photosensitive polymers comprise (a) one or more monomer (or prepolymer) molecules, which form the backbone of the polymer network of the polymeric material and define its architecture; and (b) a photoinitiator that captures illumination energy and initiates polymerization.