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    Modulated reflectance measurement system with multiple wavelengths
    1.
    发明授权
    Modulated reflectance measurement system with multiple wavelengths 有权
    多波长调制反射测量系统

    公开(公告)号：US07423757B2

    公开(公告)日：2008-09-09

    申请号：US11492583

    申请日：2006-07-25

    申请人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

    发明人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

    IPC分类号： G01N21/55

    CPC分类号： G01N21/39 ,  G01N21/1717 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2201/0612 ,  G01N2201/0691

    摘要： A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.

    摘要翻译： 调制反射测量系统包括三个基于单色二极管的激光器。 每个激光器可以作为探测光束或作为泵浦光源操作。 使用一系列反射镜和分束器将激光输出重定向到达物镜。 物镜将激光输出聚焦在样品上。 反射能量通过目标返回，并被分束器重定向到检测器。 锁定放大器转换检测器的输出以产生正交（Q）和同相（I）信号用于分析。 处理器使用Q和/或I信号来分析样本。 通过改变用作泵浦或探针光束源的激光器的数量，可以优化测量系统以测量不同样品类型的范围。

    MODULATED REFLECTANCE MEASUREMENT SYSTEM WITH MULTIPLE WAVELENGTHS
    3.
    发明申请
    MODULATED REFLECTANCE MEASUREMENT SYSTEM WITH MULTIPLE WAVELENGTHS 失效
    具有多个波长的调制反射测量系统

    公开(公告)号：US20080309943A1

    公开(公告)日：2008-12-18

    申请号：US12185297

    申请日：2008-08-04

    申请人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

    发明人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

    IPC分类号： G01N21/55

    CPC分类号： G01N21/39 ,  G01N21/1717 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2201/0612 ,  G01N2201/0691

    摘要： A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.

    摘要翻译： 调制反射测量系统包括三个基于单色二极管的激光器。 每个激光器可以作为探测光束或作为泵浦光源操作。 使用一系列反射镜和分束器将激光输出重定向到达物镜。 物镜将激光输出聚焦在样品上。 反射能量通过目标返回，并被分束器重定向到检测器。 锁定放大器转换检测器的输出以产生正交（Q）和同相（I）信号用于分析。 处理器使用Q和/或I信号来分析样本。 通过改变用作泵浦或探针光束源的激光器的数量，可以优化测量系统以测量不同样品类型的范围。

    Modulated reflectance measurement system with multiple wavelengths
    5.
    发明授权
    Modulated reflectance measurement system with multiple wavelengths 失效
    多波长调制反射测量系统

    公开(公告)号：US07619741B2

    公开(公告)日：2009-11-17

    申请号：US12185297

    申请日：2008-08-04

    申请人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

    发明人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

    IPC分类号： G01N21/00

    CPC分类号： G01N21/39 ,  G01N21/1717 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2201/0612 ,  G01N2201/0691

    摘要： A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.

    摘要翻译： 调制反射测量系统包括三个基于单色二极管的激光器。 每个激光器可以作为探测光束或作为泵浦光源操作。 使用一系列反射镜和分束器将激光输出重定向到达物镜。 物镜将激光输出聚焦在样品上。 反射能量通过目标返回，并被分束器重定向到检测器。 锁定放大器转换检测器的输出以产生正交（Q）和同相（I）信号用于分析。 处理器使用Q和/或I信号来分析样本。 通过改变用作泵浦或探针光束源的激光器的数量，可以优化测量系统以测量不同样品类型的范围。

    Modulated reflectance measurement system with fiber laser technology
    6.
    发明授权
    Modulated reflectance measurement system with fiber laser technology 失效

    公开(公告)号：US07079249B2

    公开(公告)日：2006-07-18

    申请号：US10453146

    申请日：2003-06-03

    申请人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik

    发明人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik

    IPC分类号： G01N21/00 ,  G01N21/55

    CPC分类号： G01N21/1717 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501

    摘要： A modulated reflectance measurement system includes two diode-based lasers for generating a probe beam and an intensity modulated pump beam. The pump and probe beams are joined into a collinear beam using a laser diode power combiner. One or more optical fibers are used to transport the beams either before and/or after they are combined. The collinear beam is focused through one or more lenses or other optical components for collimation. The collinear beam is then focused by an objective lens onto a sample. Reflected energy returns through an objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A processor uses the Q and/or I signals to analyze the sample.

    Methods for depth profiling in semiconductors using modulated optical reflectance technology
    7.
    发明申请
    Methods for depth profiling in semiconductors using modulated optical reflectance technology 有权
    采用调制光学反射技术的半导体深度剖面方法

    公开(公告)号：US20080151247A1

    公开(公告)日：2008-06-26

    申请号：US11998118

    申请日：2007-11-28

    申请人： Alex Salnik ,  Jon Opsal ,  Lena Nicolaides

    发明人： Alex Salnik ,  Jon Opsal ,  Lena Nicolaides

    IPC分类号： G01N21/55

    CPC分类号： G01N21/1717 ,  G01N2021/1719 ,  G01N2021/178

    摘要： Methods of obtaining dopant and damage depth profile information are disclosed using modulated optical reflectivity (MOR) measurements. In one aspect, the depth profile is constructed using information obtained from various measurements such as the junction depth, junction abruptness and dopant concentration. In another aspect, a full theoretical model is developed. Actual measurements are fed to the model. Using an iterative approach, the actual measurements are compared to theoretical measurements calculated from the model to determine the actual depth profile.

    摘要翻译： 使用调制光学反射率（MOR）测量公开了获得掺杂剂和损伤深度分布信息的方法。 在一个方面，使用从诸如结深度，结突起和掺杂剂浓度的各种测量获得的信息来构建深度分布。 另一方面，开发了一个完整的理论模型。 实际测量被馈送到模型。 使用迭代方法，将实际测量与从模型计算的理论测量值进行比较，以确定实际深度分布。

    Method for measuring ion-implanted semiconductors with improved repeatability
    10.
    发明申请
    Method for measuring ion-implanted semiconductors with improved repeatability 失效
    用于测量具有改善的重复性的离子注入半导体的方法

    公开(公告)号：US20050195399A1

    公开(公告)日：2005-09-08

    申请号：US11067961

    申请日：2005-02-28

    申请人： Lena Nicolaides ,  Mira Bakshi ,  Alex Salnik ,  Jon Opsal

    发明人： Lena Nicolaides ,  Mira Bakshi ,  Alex Salnik ,  Jon Opsal

    IPC分类号： G01N21/55

    CPC分类号： G01N21/171 ,  H01L22/12

    摘要： The repeatability of wafer uniformity measurements can be increased by taking spatially averaged measurements of wafer response. By increasing the time over which measurements are obtained, the amount of noise can be significantly reduced, thereby improving the repeatability of the measurements. These measurements can be taken at several locations on the wafer to ensure wafer uniformity. In order to get a stable and repeatable assessment of the wafer process, addressing uncertainties related to damage relaxation or incomplete anneal, an anneal decay factor (ADF) characterization can be performed at a distance away from the TW measurement boxes. From the ADF measurement and the spatially averaged measurements of wafer response, a repeatable assessment of the wafer process can be obtained.

    摘要翻译： 通过采用晶圆响应的空间平均测量可以提高晶片均匀性测量的重复性。 通过增加获得测量的时间，可以显着降低噪声量，从而提高测量的重复性。 这些测量可以在晶片上的几个位置进行，以确保晶片的均匀性。 为了获得对晶圆工艺的稳定和可重复的评估，解决与损伤弛豫或不完全退火有关的不确定性，可以在远离TW测量箱的距离处执行退火衰减因子（ADF）表征。 从ADF测量和晶片响应的空间平均测量，可以获得晶片工艺的可重复评估。