公开(公告)号：US5770948A

公开(公告)日：1998-06-23

申请号：US620723

申请日：1996-03-19

申请人： Leping Li ,  Steven George Barbee ,  Arnold Halperin ,  Richard Mars Ruggiero ,  William Joseph Surovie

发明人： Leping Li ,  Steven George Barbee ,  Arnold Halperin ,  Richard Mars Ruggiero ,  William Joseph Surovie

IPC分类号： B24B37/013 ,  B24B37/24 ,  B24B37/26 ,  G01B7/06 ,  H01L21/302

CPC分类号： B24B37/013 ,  B24B37/245 ,  B24B37/26 ,  B24B49/12 ,  G01B7/06

摘要： An apparatus for rotary signal coupling in in-situ monitoring of a chemical-mechanical polishing process by a polisher is provided with a sensor fixed to a rotatable wafer carrier for creating a signal responsive to the chemical mechanical polishing process, a conductor coupled to the sensor for receiving the signal, the conductor fixed to the rotatable wafer carrier, a contact coupled to the conductor, the contact fixed to a stationary drive arm, and signal transfer means coupled to the contact for transferring the signal to a monitoring means.

摘要翻译： 用于通过抛光机原位监测化学机械抛光工艺的旋转信号耦合装置设置有固定到可旋转晶片载体的传感器，用于产生响应于化学机械抛光工艺的信号，耦合到传感器的导体 为了接收信号，固定到可旋转晶片载体的导体，耦合到导体的触点，固定到固定驱动臂的触点和耦合到触点的信号传送装置，用于将信号传送到监视装置。