公开(公告)号：US20100200772A1

公开(公告)日：2010-08-12

申请号：US12771466

申请日：2010-04-30

申请人： Levinus Pieter BAKKER ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

发明人： Levinus Pieter BAKKER ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

IPC分类号： G21K5/04

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

摘要翻译： 辐射系统包括被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎片的污染屏障。 污染屏障包括多个薄片。 薄片的表面包括材料。 辐射系统还包括被配置成收集来自污染屏障的辐射的收集器。 收集器的光学表面包括与薄片表面的材料相同的材料。

公开(公告)号：US07737425B2

公开(公告)日：2010-06-15

申请号：US11798710

申请日：2007-05-16

申请人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

发明人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

IPC分类号： G21F1/12

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.

摘要翻译： 被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎屑的污染屏障。 污染屏障包括支撑结构，布置在支撑结构上并沿着径向方向从支撑结构的轴线延伸的多个板构件以及被构造成阻挡支撑结构的至少一部分被辐射撞击的屏蔽 或来自辐射源的碎片。

公开(公告)号：US08129702B2

公开(公告)日：2012-03-06

申请号：US12771466

申请日：2010-04-30

申请人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

发明人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

IPC分类号： G21F1/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

摘要翻译： 辐射系统包括被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎片的污染屏障。 污染屏障包括多个薄片。 薄片的表面包括材料。 辐射系统还包括被配置成收集来自污染屏障的辐射的收集器。 收集器的光学表面包括与薄片表面的材料相同的材料。

公开(公告)号：US07247866B2

公开(公告)日：2007-07-24

申请号：US10743265

申请日：2003-12-23

申请人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

发明人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

IPC分类号： G21G5/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A contamination barrier that passes through radiation from a radiation source and captures debris coming from the radiation source is disclosed. The contamination barrier includes an inner ring, an outer ring, and a plurality of lamellas. The lamellas extend in a radial direction from a main axis, and each of the lamellas is positioned in a respective plane that include the main axis. At least one outer end of each of the lamellas is slidably connected to at least one of the inner and outer ring.

摘要翻译： 公开了一种通过来自辐射源的辐射并捕获来自辐射源的碎片的污染屏障。 污染屏障包括内环，外环和多个薄片。 薄片从主轴沿径向方向延伸，并且每个薄片位于包括主轴线的相应平面中。 每个薄片的至少一个外端可滑动地连接到内圈和外圈中的至少一个。

公开(公告)号：US07495239B2

公开(公告)日：2009-02-24

申请号：US11314099

申请日：2005-12-22

申请人： Johannes Maria Freriks ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov

发明人： Johannes Maria Freriks ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov

IPC分类号： G03F7/20 ,  G21G5/00 ,  A61N5/00 ,  C23F1/00 ,  C25F1/00 ,  H05H1/00 ,  H05H1/24

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  G03F7/70166

摘要： A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa).

摘要翻译： 用于光刻设备模块的清洁装置可以设置在收集器中。 清洁装置包括被配置为向至少部分模块提供含氢自由基气体的氢根源，以及构造成将气体泵送通过模块的泵，使得通过至少部分的至少一部分提供含氢自由基气体的流速 该模块至少为1米/秒。 清洁装置还可以包括配置成将含氢自由基气体的流动调制到模块的至少一部分的气闸，与模块连通的至少1m 3的缓冲体积以及配置成提供气体的泵 缓冲体积在0.001毫巴（0.1帕）至1毫巴（100帕）之间的压力。

公开(公告)号：US20070145297A1

公开(公告)日：2007-06-28

申请号：US11444535

申请日：2006-06-01

申请人： Johannes Maria Freriks ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Johannes Maria Freriks ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G03F7/20

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70925

摘要： A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa). The cleaning arrangement may further include a gas return system.

摘要翻译： 用于光刻设备模块的清洁装置可以设置在收集器中。 清洁装置包括被配置为向至少部分模块提供含氢自由基气体的氢根源，以及构造成将气体泵送通过模块的泵，使得通过至少部分的至少一部分提供含氢自由基气体的流速 该模块至少为1米/秒。 清洁装置还可以包括配置成将含氢自由基气体的流动调制到模块的至少一部分的气闸，与模块连通的至少1m 3的缓冲体积， 以及配置成在0.001mbar（0.1Pa）和1mbar（100Pa）之间的缓冲体积中提供气体压力的泵。 清洁装置还可以包括气体返回系统。

公开(公告)号：US07504643B2

公开(公告)日：2009-03-17

申请号：US11444535

申请日：2006-06-01

申请人： Johannes Maria Freriks ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Johannes Maria Freriks ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G03F7/20 ,  G21G5/00 ,  A61N5/00 ,  C23F1/00 ,  C25F1/00 ,  H05H1/00 ,  H05H1/24

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70925

摘要： A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa). The cleaning arrangement may further include a gas return system.

摘要翻译： 用于光刻设备模块的清洁装置可以设置在收集器中。 清洁装置包括被配置为向至少部分模块提供含氢自由基气体的氢根源，以及构造成将气体泵送通过模块的泵，使得通过至少部分的至少一部分提供含氢自由基气体的流速 该模块至少为1米/秒。 清洁装置还可以包括配置成将含氢自由基气体的流动调制到模块的至少一部分的气闸，与模块连通的至少1m 3的缓冲体积以及配置成提供气体的泵 缓冲体积在0.001毫巴（0.1帕）至1毫巴（100帕）之间的压力。 清洁装置还可以包括气体返回系统。