Plasma System
    1.
    发明申请
    Plasma System 审中-公开
    等离子体系统

    公开(公告)号:US20090065485A1

    公开(公告)日:2009-03-12

    申请号:US11718618

    申请日:2005-11-03

    IPC分类号: H05H1/24 C23C16/513

    摘要: In a process for plasma treating a surface, a non-equilibrium atmospheric pressure plasma is generated within a dielectric housing having an inlet and an outlet through which a process gas flows from the inlet to the outlet. A tube formed at least partly of dielectric material extends outwardly from the outlet of the housing, whereby the end of the tube forms the plasma outlet. The surface to be treated is positioned adjacent to the plasma outlet so that the surface is in contact with the plasma and is moved relative to the plasma outlet.

    摘要翻译: 在用于等离子体处理表面的过程中,在具有入口和出口的介电壳体内产生非平衡大气压等离子体,工艺气体通过入口和出口从入口流到出口。 至少部分由介电材料形成的管从壳体的出口向外延伸,由此管的端部形成等离子体出口。 待处理的表面位于等离子体出口附近,使得表面与等离子体接触并且相对于等离子体出口移动。