公开(公告)号：US09690215B2

公开(公告)日：2017-06-27

申请号：US14716801

申请日：2015-05-19

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Guido de Boer ,  Thomas Adrian Ooms ,  Niels Vergeer ,  Godefridus Cornelius Antonius Couweleers

IPC: G01B11/02 ,  G03F7/20 ,  G01B9/02

CPC classification number: G03F7/70775 ,  G01B9/02007 ,  G01B9/02015 ,  G03F7/70833 ,  G03F7/7085 ,  H01J2237/30438

Abstract: The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.

公开(公告)号：US20150268032A1

公开(公告)日：2015-09-24

申请号：US14716801

申请日：2015-05-19

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Guido de Boer ,  Thomas Adrian Ooms ,  Niels Vergeer ,  Godefridus Cornelius Antonius Couweleers

IPC: G01B9/02

CPC classification number: G03F7/70775 ,  G01B9/02007 ,  G01B9/02015 ,  G03F7/70833 ,  G03F7/7085 ,  H01J2237/30438

Abstract: The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.

Abstract translation: 本发明涉及一种用于测量参考反射镜和测量镜之间的位移方向的差分干涉仪模块。 在一个实施例中，差分干涉仪模块适于朝向第一反射镜发射三个参考光束，并且三个测量光束朝向第二反射镜发射以确定所述第一和第二反射镜之间的位移。 在优选实施例中，相同的模块也用于测量围绕两个垂直轴的相对旋转。 本发明还涉及包括这种干涉仪模块的光刻系统和用于测量这种位移和旋转的方法。