专利检索 ap:("MELLANOX TECHNOLOGIES, LTD.") AND inv:"Oscar Mauricio Forero Camacho" 第 1 页

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发明公开
Efficient Semiconductor Metrology Using Machine Learning 审中-公开

公开(公告)号：US20230317528A1

公开(公告)日：2023-10-05

申请号：US17709458

申请日：2022-03-31

申请人： MELLANOX TECHNOLOGIES, LTD.

发明人： Juan Jose Vegas Olmos , Oscar Mauricio Forero Camacho , Liran Liss , Elad Mentovich

IPC分类号： H01L21/66 , G06N3/04 , G06N3/08 , G03F7/20

CPC分类号： H01L22/12 , G06N3/04 , G06N3/08 , G03F7/70508 , G03F7/70633 , G03F7/7065 , G03F7/70658

摘要： A metrology system includes metrology equipment, a remote communication link, a local communication link, and a data processing unit (DPU). The metrology equipment is configured to generate a stream of data relating to inspected wafers, and to format the generated data into first and second data types. The remote communication link is configured to communicate with an external system. The data processing unit (DPU) is configured to (i) using the remote communication link, send the data belonging to the first data type directly to the external system, and (ii) perform analysis on the data belonging to the second data type, and, using the local communication link, provide results of the analysis to the metrology equipment.