Passivation of Micro-Discontinuous Chromium Deposited From a Trivalent Electrolyte
    1.
    发明申请
    Passivation of Micro-Discontinuous Chromium Deposited From a Trivalent Electrolyte 有权
    从三价电解质沉积的微不连续铬的钝化

    公开(公告)号:US20150252487A1

    公开(公告)日:2015-09-10

    申请号:US14200546

    申请日:2014-03-07

    CPC classification number: C25D3/06 C25D5/48 C25D9/08 Y10T428/12854

    Abstract: A method of treating a substrate, wherein the substrate comprises a layer deposited from a trivalent chromium electrolyte, is described. The method includes the steps of providing an anode and the chromium(III) plated substrate as a cathode in an electrolyte comprising (i) a trivalent chromium salt; and (ii) a complexant; and passing an electrical current between the anode and the cathode to passivate the chromium(III) plated substrate. The substrate may be first plated with a plated nickel layer so that the chromium(III) plated layer is deposited over the nickel plated layer.

    Abstract translation: 描述了一种处理衬底的方法,其中衬底包括由三价铬电解质沉积的层。 该方法包括以下步骤:在电解质中提供阳极和镀有铬(III)的底物作为阴极,其包括(i)三价铬盐; 和(ii)复合物; 并在阳极和阴极之间通过电流以钝化镀铬(III)的衬底。 可以首先将衬底镀覆镀镍层,以使镀铬层(III)沉积在镀镍层上。

Patent Agency Ranking