Methods for producing in-situ grooves in Chemical Mechanical Planarization (CMP) pads, and novel CMP pad designs
    1.
    发明申请
    Methods for producing in-situ grooves in Chemical Mechanical Planarization (CMP) pads, and novel CMP pad designs 有权
    在化学机械平面化(CMP)焊盘中制造原位槽的方法,以及新型的CMP焊盘设计

    公开(公告)号:US20060019587A1

    公开(公告)日:2006-01-26

    申请号:US10897192

    申请日:2004-07-21

    IPC分类号: B24D11/00

    摘要: Methods for producing in-situ grooves in CMP pads are provided. In general, the methods for producing in-situ grooves comprise the steps of patterning a silicone lining, placing the silicone lining in, or on, a mold, adding CMP pad material to the silicone lining, and allowing the CMP pad to solidify. CMP pads comprising novel groove designs are also described. For example, described here are CMP pads comprising concentric circular grooves and axially curved grooves, reverse logarithmic grooves, overlapping circular grooves, lassajous groves, double spiral grooves, and multiply overlapping axially curved grooves. The CMP pads may be made from polyurethane, and the grooves produced therein may be made by a method from the group consisting of silicone lining, laser writing, water jet cutting, 3-D printing, thermoforming, vacuum forming, micro-contact printing, hot stamping, and mixtures thereof.

    摘要翻译: 提供了用于在CMP垫中产生原位凹槽的方法。 通常,用于制造原位槽的方法包括将硅衬里图案化,将硅衬里放置在模具中或模具上,将CMP衬垫材料添加到硅衬里,并允许CMP垫固化的步骤。 还描述了包括新颖凹槽设计的CMP垫。 例如,这里描述的是包括同心圆形槽和轴向弯曲槽,反向对数槽,重叠圆形槽,拉索格,双螺旋槽和多重重叠的轴向曲线槽的CMP垫。 CMP垫可以由聚氨酯制成,并且其中产生的凹槽可以由以下方法制成:由硅胶衬里,激光书写,水射流切割,3-D印刷,热成型,真空成型,微接触印刷, 热冲压及其混合物。