公开(公告)号：US08841920B2

公开(公告)日：2014-09-23

申请号：US14064255

申请日：2013-10-28

Applicant: Mapper Lithography IP B.V.

Inventor： Guido De Boer ,  Johnny Joannes Jacobus Van Baar ,  Kaustubh Prabodh Padhye ,  Robert Mossel ,  Niels Vergeer ,  Stijn Willem Herman Karel Steenbrink

IPC: G01R27/26 ,  G01D5/241 ,  G01D3/036 ,  G01B7/02 ,  G03F9/00

CPC classification number: G01B7/023 ,  G01D3/036 ,  G01D5/2417 ,  G03F9/7026 ,  G03F9/7053

Abstract: The invention relates to a lithography system. The lithography system has a projection lens system and a capacitive sensing system. The projection lens system is provided with a final projection lens. The capacitive sensing system is arranged for making a measurement related to a distance between the final projection lens and a target. The capacitive sensing system includes at least one capacitive sensor. Additional, the capacitive sensing system is provided with a flexible printed circuit structure and at least one integrated flex print connector. The at least one sensor is located in the flexible printed circuit structure. The flexible printed circuit structure has a flexible base provided with conductive electrodes for the at least one sensor and conductive tracks. The conductive tracks extend from the electrodes along the at least one integrated flex print connector.

Abstract translation: 本发明涉及一种光刻系统。 光刻系统具有投影透镜系统和电容感测系统。 投影透镜系统设置有最终投影透镜。 电容感测系统被布置用于进行与最终投影透镜和目标之间的距离相关的测量。 电容感测系统包括至少一个电容式传感器。 此外，电容感测系统设置有柔性印刷电路结构和至少一个集成的柔性印刷连接器。 至少一个传感器位于柔性印刷电路结构中。 柔性印刷电路结构具有柔性基底，该基底设置有用于至少一个传感器和导电轨道的导电电极。 导电轨迹沿着至少一个集成的柔性印刷连接器从电极延伸。