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公开(公告)号：US09457549B2
公开(公告)日：2016-10-04
申请号：US14662346
申请日：2015-03-19
Applicant: MAPPER LITHOGRAPHY IP B.V.
Inventor： Guido De Boer , Ralph Van Melle , Teunis Van De Peut , Henk Derks , Frederik Matthias Spiegelhalder , Roy Josephus Stephanus Derks , Edwin Johannes Theodorus Smulders
CPC classification number: B32B37/142 , B32B37/1284 , B32B37/1292 , B32B38/0012 , B32B2551/00 , B82Y10/00 , B82Y40/00 , G02B6/3612 , H01J37/3177 , H01J2237/0435 , H01J2237/2482 , Y10T156/1002
Abstract: A method for forming an optical fiber array. A substrate having a first surface and an opposing second surface is provided. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. In addition, a plurality of fibers are provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. A first fiber is inserted in a first corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted first fiber is bent in a predetermined direction such that the fiber abuts a side wall of the first aperture at a predetermined position. After the first fiber is bent, a second fiber is inserted in a second corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted second fiber is bent in conformity with a shape of the first fiber, such that the fiber abuts a side wall of the second aperture at a predetermined position. The bent fibers are bonded together using an adhesive material.
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公开(公告)号：US09665013B2
公开(公告)日：2017-05-30
申请号：US14135372
申请日：2013-12-19
Applicant: Mapper Lithography IP B.V.
Inventor： Guido De Boer , Michel Pieter Dansberg , Pieter Kruit
CPC classification number: G03F7/70691 , G03F7/707 , G03F7/70783 , G03F7/70875
Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer of stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.
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公开(公告)号：US10054863B2
公开(公告)日：2018-08-21
申请号：US14630678
申请日：2015-02-25
Applicant: MAPPER LITHOGRAPHY IP B.V.
Inventor： Guido De Boer , Niels Vergeer
IPC: G03F9/00 , B82Y40/00 , H01J37/317 , H01J37/04 , B82Y10/00 , H01J37/304
CPC classification number: G03F9/7076 , B82Y10/00 , B82Y40/00 , G03F9/7046 , G03F9/7084 , H01J37/3045 , H01J37/3174
Abstract: The invention relates to a substrate comprising an optical position mark for being read-out by an optical recording head for emitting light of predetermined wavelength, preferably red or infra-red light, more in particular of 635 nm light, the optical position mark having a mark height, a mark length and a predetermined known position on the substrate, the optical position mark extending along a longitudinal direction and being arranged for varying a reflection coefficient of the position mark along said longitudinal direction, wherein the optical position mark comprises: a first region having a first reflection coefficient and a first width; a second region neighboring the first region and forming a first region pair, the second region having a second reflection coefficient and a second width, and the second reflection coefficient being different from the first reflection coefficient, wherein the first region comprises sub-wavelength structures in comparison with a wavelength of the predetermined wavelength light.
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Patent Agency Ranking
公开(公告)号：US09507629B2
公开(公告)日：2016-11-29
申请号：US14738962
申请日：2015-06-15
Applicant: MAPPER LITHOGRAPHY IP B.V.
Inventor： Marcel Nicolaas Jacobus Van Kervinck , Guido De Boer
IPC: G06F9/46 , G06F19/00 , G06F9/48 , G03F7/20 , H01J37/317 , B82Y10/00 , B82Y40/00 , G05B19/418
CPC classification number: G06F9/48 , B82Y10/00 , B82Y40/00 , G03F7/70483 , G03F7/70508 , G03F7/70525 , G03F7/70991 , G05B19/41865 , G06F9/4881 , H01J37/3177
Abstract: A lithography system having one or more lithography elements Each lithography element has a plurality of lithography subsystems. The lithography system further has a control network forming a control network path between the plurality of the lithography subsystems and at least one element control unit for communication of control information. The lithography system is arranged for: issuing control information to the at least one element control unit to control operation of one or more of the lithography subsystems for exposure of one or more wafers; issuing a process program to the element control unit. The process program has a set of predefined commands and associated parameters. The element control unit is arranged to transmit a command of the process program to a lithography subsystem to be executed by the lithography subsystem, regardless of an execution status of a preceding command transmitted to the lithography subsystem.
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公开(公告)号：US09645511B2
公开(公告)日：2017-05-09
申请号：US14135378
申请日：2013-12-19
Applicant: Mapper Lithography IP B.V.
Inventor： Guido De Boer , Michel Pieter Dansberg , Pieter Kruit
CPC classification number: G03F7/70691 , G03F7/707 , G03F7/70783 , G03F7/70875
Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer or stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.
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公开(公告)号：US09575418B2
公开(公告)日：2017-02-21
申请号：US14850997
申请日：2015-09-11
Applicant: Mapper Lithography IP B.V.
Inventor： Vincent Sylvester Kuiper , Erwin Slot , Marcel Nicolaas Jacobus Van Kervinck , Guido De Boer , Hendrik Jan De Jong
IPC: G03B27/60 , G03B27/58 , G03F7/20 , H01L21/67 , H01L21/677
CPC classification number: G03F7/70733 , G03F7/7075 , H01L21/67178 , H01L21/67225 , H01L21/67745
Abstract: An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.
Abstract translation: 一种用于将基板或基板支撑结构的目标（例如基板被夹紧到其上的基板）从基板传送系统传送到光刻系统的真空室的装置。 该装置包括用于将目标物输入和离开真空室的装载锁定室。 所述装载锁定室包括具有第一通道的第一壁，所述第一通道提供机器人空间与所述装载锁定室的内部之间的通路;第二壁，其具有提供在所述负载锁定室的内部与所述真空室之间的通路的第二通道，以及 用于传送所述目标的多个处理机器人包括：可在所述机器人空间内移动的第一处理机器人，以接近所述基板传送系统和所述第一通道; 以及第二处理机器人，其能够在所述加载锁定室内移动以接近所述第一通道和所述第二通道。
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公开(公告)号：US08841920B2
公开(公告)日：2014-09-23
申请号：US14064255
申请日：2013-10-28
Applicant: Mapper Lithography IP B.V.
Inventor： Guido De Boer , Johnny Joannes Jacobus Van Baar , Kaustubh Prabodh Padhye , Robert Mossel , Niels Vergeer , Stijn Willem Herman Karel Steenbrink
CPC classification number: G01B7/023 , G01D3/036 , G01D5/2417 , G03F9/7026 , G03F9/7053
Abstract: The invention relates to a lithography system. The lithography system has a projection lens system and a capacitive sensing system. The projection lens system is provided with a final projection lens. The capacitive sensing system is arranged for making a measurement related to a distance between the final projection lens and a target. The capacitive sensing system includes at least one capacitive sensor. Additional, the capacitive sensing system is provided with a flexible printed circuit structure and at least one integrated flex print connector. The at least one sensor is located in the flexible printed circuit structure. The flexible printed circuit structure has a flexible base provided with conductive electrodes for the at least one sensor and conductive tracks. The conductive tracks extend from the electrodes along the at least one integrated flex print connector.
Abstract translation: 本发明涉及一种光刻系统。 光刻系统具有投影透镜系统和电容感测系统。 投影透镜系统设置有最终投影透镜。 电容感测系统被布置用于进行与最终投影透镜和目标之间的距离相关的测量。 电容感测系统包括至少一个电容式传感器。 此外，电容感测系统设置有柔性印刷电路结构和至少一个集成的柔性印刷连接器。 至少一个传感器位于柔性印刷电路结构中。 柔性印刷电路结构具有柔性基底，该基底设置有用于至少一个传感器和导电轨道的导电电极。 导电轨迹沿着至少一个集成的柔性印刷连接器从电极延伸。
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公开(公告)号：US20140197330A1
公开(公告)日：2014-07-17
申请号：US14241109
申请日：2012-09-10
Applicant: MAPPER LITHOGRAPHY IP B.V.
IPC: H01J37/20 , H01J37/317 , F16F15/04
CPC classification number: H01J37/20 , B82Y10/00 , B82Y40/00 , F16F15/04 , F16F15/085 , G03F7/70833 , G03F7/709 , H01J37/02 , H01J37/3177 , H01J2237/0216
Abstract: The invention relates to a vibration isolation module (101) for a lithographic apparatus or an inspection apparatus. The module comprises a support frame (102), an intermediate body (103) and a support body (104) for accommodating the lithographic apparatus. The intermediate body is connected to the support frame by means of at least one spring element such that the intermediate body is a hanging body. The support body is connected to the intermediate body by means of at least one pendulum rod (108) such that the support body is a hanging body. The invention further relates to a substrate processing system comprising such vibration isolation module.
Abstract translation: 本发明涉及一种用于光刻设备或检查设备的隔振模块（101）。 模块包括用于容纳光刻设备的支撑框架（102），中间体（103）和支撑体（104）。 中间体通过至少一个弹簧元件连接到支撑框架，使得中间体是悬挂体。 支撑体通过至少一个摆杆（108）连接到中间体，使得支撑体是悬挂体。 本发明还涉及包括这种隔振模块的基板处理系统。
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