Use of amide derivative of ge 2270 factor a3 for the treatment of acne
    7.
    发明申请
    Use of amide derivative of ge 2270 factor a3 for the treatment of acne 有权
    使用ge 2270因子a3的酰胺衍生物治疗痤疮

    公开(公告)号:US20070117825A1

    公开(公告)日:2007-05-24

    申请号:US10518802

    申请日:2003-06-06

    IPC分类号: A61K31/4745

    CPC分类号: A61K38/12

    摘要: Use of the compound of formula (I) and the pharmaceutically acceptable addition salts thereof for the manufacture of a medicament for topical treatment or 5 prevention of acne formula (I) wherein: R represents methoxymethyl, R1 represents methyl, Rz represents methyl, Y represents the group formula (II) The compound of formula (I) and the pharmaceutically acid addition salts thereof show selective activity against propionibacterium acne and are suitable for use in a method of treatment or prevention of acne.

    摘要翻译: 式(I)化合物及其药学上可接受的加成盐在制备用于局部治疗的药物或5防止痤疮配方(I)中的用途,其中:R表示甲氧基甲基,R1表示甲基,Rz表示甲基,Y表示 基团式(II)式(I)化合物及其药学上可接受的酸加成盐显示对丙酸杆菌的选择性活性,适用于治疗或预防痤疮的方法。