公开(公告)号：US20100085551A1

公开(公告)日：2010-04-08

申请号：US12563838

申请日：2009-09-21

申请人： Marcus Martinus Petrus Adrianus VERMEULEN ,  Andre Bernardus JEUNINK ,  Erik Roelof LOOPSTRA ,  Joost Jeroen OTTENS ,  Rene Theodorus Petrus COMPEN ,  Peter SMITS ,  Martijn HOUBEN ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Antonius Arnoldus MEULENDIJKS ,  Rene Wilhelmus Antonius Hubertus LEENAARS

发明人： Marcus Martinus Petrus Adrianus VERMEULEN ,  Andre Bernardus JEUNINK ,  Erik Roelof LOOPSTRA ,  Joost Jeroen OTTENS ,  Rene Theodorus Petrus COMPEN ,  Peter SMITS ,  Martijn HOUBEN ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Antonius Arnoldus MEULENDIJKS ,  Rene Wilhelmus Antonius Hubertus LEENAARS

IPC分类号： G03B27/72

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 设置有构造成保持基板的基板台的反射镜块; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述反射镜块被构造和布置成减小所述反射镜块和所述基板台之间的滑动。 如果镜面块的加速度高，并且衬底台相对于镜面块局部滑动，则可能发生滑移。 滑动可能导致曝光误差，因为不再以所需精度确定基板的位置。