公开(公告)号：US20100085551A1

公开(公告)日：2010-04-08

申请号：US12563838

申请日：2009-09-21

申请人： Marcus Martinus Petrus Adrianus VERMEULEN ,  Andre Bernardus JEUNINK ,  Erik Roelof LOOPSTRA ,  Joost Jeroen OTTENS ,  Rene Theodorus Petrus COMPEN ,  Peter SMITS ,  Martijn HOUBEN ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Antonius Arnoldus MEULENDIJKS ,  Rene Wilhelmus Antonius Hubertus LEENAARS

发明人： Marcus Martinus Petrus Adrianus VERMEULEN ,  Andre Bernardus JEUNINK ,  Erik Roelof LOOPSTRA ,  Joost Jeroen OTTENS ,  Rene Theodorus Petrus COMPEN ,  Peter SMITS ,  Martijn HOUBEN ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Antonius Arnoldus MEULENDIJKS ,  Rene Wilhelmus Antonius Hubertus LEENAARS

IPC分类号： G03B27/72

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 设置有构造成保持基板的基板台的反射镜块; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述反射镜块被构造和布置成减小所述反射镜块和所述基板台之间的滑动。 如果镜面块的加速度高，并且衬底台相对于镜面块局部滑动，则可能发生滑移。 滑动可能导致曝光误差，因为不再以所需精度确定基板的位置。

公开(公告)号：US20110076352A1

公开(公告)日：2011-03-31

申请号：US12891422

申请日：2010-09-27

申请人： Arie Jeffrey DEN BOEF ,  Vadim Yevgenyevich BANINE ,  Andre Bernardus JEUNINK ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN

发明人： Arie Jeffrey DEN BOEF ,  Vadim Yevgenyevich BANINE ,  Andre Bernardus JEUNINK ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN

IPC分类号： B29C59/02 ,  G01B11/14

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7076

摘要： A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.

摘要翻译： 公开了一种使用压印模板上的对准光栅和衬底上的对准光栅来确定压印模板和衬底之间的偏移的方法。 该方法包括使压印模板对准光栅和衬底对准光栅足够靠近在一起，使得它们形成复合光栅，在调制压印模板和衬底的相对位置的同时调整复合光栅处的对准辐射束，检测强度 从复合光栅反射的对准辐射，并通过分析检测强度的调制来确定偏移。