公开(公告)号：US20100143832A1

公开(公告)日：2010-06-10

申请号：US12632160

申请日：2009-12-07

申请人： Martijn HOUBEN

发明人： Martijn HOUBEN

IPC分类号： G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table. The gap size is reduced using an edge member which may be, for example, a ring known as a BES (Bubble Extraction System) ring. Information regarding the shape and/or cross-sectional dimension (e.g., diameter) of the substrate, or information regarding the size of the gap, is transmitted to a controller that controls the edge member in order for the edge member, for example, to be reduced to an appropriate size to reduce the gap as much as possible, desirably without compressing the edge of the substrate. Alternatively or additionally, the gap may be reduced by moving the substrate and/or edge member adjacent the edge of a surface of the substrate table.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积来降低或防止浸没液中的气泡形成。 使用可以是例如称为BES（气泡提取系统）环的环的边缘构件来减小间隙尺寸。 关于基板的形状和/或横截面尺寸（例如，直径）的信息或关于间隙的尺寸的信息被传送到控制边缘构件以便边缘构件的控制器，例如， 减小到适当的尺寸以尽可能地减小间隙，理想地不压缩基底的边缘。 或者或另外，可以通过移动邻近衬底台的表面的边缘的衬底和/或边缘构件来减小间隙。

公开(公告)号：US20100085551A1

公开(公告)日：2010-04-08

申请号：US12563838

申请日：2009-09-21

申请人： Marcus Martinus Petrus Adrianus VERMEULEN ,  Andre Bernardus JEUNINK ,  Erik Roelof LOOPSTRA ,  Joost Jeroen OTTENS ,  Rene Theodorus Petrus COMPEN ,  Peter SMITS ,  Martijn HOUBEN ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Antonius Arnoldus MEULENDIJKS ,  Rene Wilhelmus Antonius Hubertus LEENAARS

发明人： Marcus Martinus Petrus Adrianus VERMEULEN ,  Andre Bernardus JEUNINK ,  Erik Roelof LOOPSTRA ,  Joost Jeroen OTTENS ,  Rene Theodorus Petrus COMPEN ,  Peter SMITS ,  Martijn HOUBEN ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Antonius Arnoldus MEULENDIJKS ,  Rene Wilhelmus Antonius Hubertus LEENAARS

IPC分类号： G03B27/72

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 设置有构造成保持基板的基板台的反射镜块; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述反射镜块被构造和布置成减小所述反射镜块和所述基板台之间的滑动。 如果镜面块的加速度高，并且衬底台相对于镜面块局部滑动，则可能发生滑移。 滑动可能导致曝光误差，因为不再以所需精度确定基板的位置。

公开(公告)号：US20070263200A1

公开(公告)日：2007-11-15

申请号：US11433760

申请日：2006-05-15

申请人： Rene Petrus Compen ,  Oleg Voznyi ,  Martijn Houben ,  Majid Bouchaibi ,  Franciscus Boekholt ,  Remko Wakker

发明人： Rene Petrus Compen ,  Oleg Voznyi ,  Martijn Houben ,  Majid Bouchaibi ,  Franciscus Boekholt ,  Remko Wakker

IPC分类号： G03B27/58

CPC分类号： G03F7/70783 ,  G03F7/707

摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed, the apparatus including a substrate table constructed to hold a substrate, a first clamping system configured to clamp the substrate table to a substrate table support structure, and a second clamping system configured to clamp a substrate to the substrate table after the substrate table has been clamped to the substrate table support structure.

摘要翻译： 公开了一种布置成将图案从图案形成装置转印到基板上的光刻设备，该设备包括被构造成保持基板的基板台，被配置为将基板台夹持到基板台支撑结构的第一夹紧系统，以及第二 夹紧系统构造成在衬底台已被夹持到衬底台支撑结构之后将衬底夹持到衬底台。

公开(公告)号：US09897928B2

公开(公告)日：2018-02-20

申请号：US13586728

申请日：2012-08-15

申请人： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

发明人： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/70341

摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

公开(公告)号：US08970822B2

公开(公告)日：2015-03-03

申请号：US13586689

申请日：2012-08-15

申请人： Johan Gertrudis Cornelis Kunnen ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Hendrikus Johannes Marinus Van Abeelen ,  Armand Rosa Jozef Dassen ,  Sander Catharina Reinier Derks

发明人： Johan Gertrudis Cornelis Kunnen ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Hendrikus Johannes Marinus Van Abeelen ,  Armand Rosa Jozef Dassen ,  Sander Catharina Reinier Derks

IPC分类号： G03F7/20 ,  H01L21/68

CPC分类号： G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/68 ,  H01L21/6875

摘要： A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

摘要翻译： 用于光刻设备的支撑台，支撑台具有支撑部分和调节系统，其中支撑部分，调节系统或两者都被配置成使得热传递到支撑在支撑台上的基板或从支撑在支撑台上的基板，导致 从处理系统的操作来看，在衬底的与衬底边缘相邻的区域中比在衬底中心处的区域更大。

公开(公告)号：US20130045447A1

公开(公告)日：2013-02-21

申请号：US13586728

申请日：2012-08-15

申请人： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

发明人： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

IPC分类号： B23Q3/00 ,  G03F7/20 ,  H05B3/68

CPC分类号： G03F7/70875 ,  G03F7/70341

摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

摘要翻译： 支撑台，其被配置为支撑基板，所述支撑台具有支撑部分以支撑基板和调节系统以向所述支撑部分提供热能和/或从所述支撑部分移除热能，其中所述调节系统包括多个调节单元 这是独立可控的。

公开(公告)号：US20130038854A1

公开(公告)日：2013-02-14

申请号：US13569926

申请日：2012-08-08

申请人： Johan Gertrudis Cornelis KUNNEN ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Frank Johannes Jacobus Van Boxtel ,  Sander Catharina Reinier Derks

发明人： Johan Gertrudis Cornelis KUNNEN ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Frank Johannes Jacobus Van Boxtel ,  Sander Catharina Reinier Derks

IPC分类号： G03B27/60

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/683

摘要： A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m.K) at 298 K.

摘要翻译： 公开了一种衬底台组件，浸没式光刻设备和器件制造方法。 衬底台组件包括用于支撑衬底的衬底台; 以及气体处理系统，用于向衬底台和安装在衬底台上的衬底之间的区域提供气体，其中由气体处理系统提供的气体具有大于或等于100mW /（mK）的热导率， 298 K.

公开(公告)号：US20180284627A1

公开(公告)日：2018-10-04

申请号：US15932215

申请日：2018-02-16

申请人： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

发明人： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

IPC分类号： G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/70341

摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

公开(公告)号：US08384882B2

公开(公告)日：2013-02-26

申请号：US12580066

申请日：2009-10-15

申请人： Rene Theodorus Petrus Compen ,  Gerardus Petrus Matthijs Van Nunen ,  Martijn Houben ,  Marco Adrianus Peter Van Den Heuvel

发明人： Rene Theodorus Petrus Compen ,  Gerardus Petrus Matthijs Van Nunen ,  Martijn Houben ,  Marco Adrianus Peter Van Den Heuvel

IPC分类号： G03B27/32 ,  G03B27/58

CPC分类号： G03B27/58 ,  G03F7/70516 ,  G03F7/70691

摘要： A calibration method for calibrating an optimum take over height of a substrate in a lithographic apparatus between a substrate table and an ejector element moveable to load and unload the substrate from the substrate table, the method including clamping the substrate on one of the substrate table and ejector element; moving the ejector element between an unloaded state wherein the substrate is supported by the substrate table and a loaded state wherein the substrate is at least partly supported by the ejector element; determining a reference height of the ejector element at the moment that the weight of the substrate is at least partly taken over between the substrate table and the ejector element; and determining the optimum take over height for the ejector element from the determined reference height.

摘要翻译： 一种校准方法，用于校准光刻设备中的基板的最佳接管高度，该基板在基板台和顶板元件之间移动，可移动以从基板台装载和卸载基板，该方法包括将基板夹在基板台之一和 喷射元件 在所述衬底被所述衬底台支撑的卸载状态和所述衬底至少部分地被所述顶出器元件支撑的负载状态之间移动所述顶出器元件; 在衬底的重量至少部分地覆盖在衬底台和顶出器元件之间的时刻，确定顶出器元件的基准高度; 以及从所确定的参考高度确定所述喷射器元件的最佳接管高度。

公开(公告)号：US20110199592A1

公开(公告)日：2011-08-18

申请号：US12946618

申请日：2010-11-15

申请人： Roelof Frederik De Graff ,  Marcus Adrianus Van De Kerkhof ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Gerardus Martinus Antonius De Rooij ,  Martijn Houben ,  Nina Vladimirovna Dziomkina ,  Johanna Antoinette Maria Sondag-Huethorst ,  Niek Elout De Kruijf ,  Vijay Kumar Badam

发明人： Roelof Frederik De Graff ,  Marcus Adrianus Van De Kerkhof ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Gerardus Martinus Antonius De Rooij ,  Martijn Houben ,  Nina Vladimirovna Dziomkina ,  Johanna Antoinette Maria Sondag-Huethorst ,  Niek Elout De Kruijf ,  Vijay Kumar Badam

IPC分类号： G03B27/52 ,  C09J7/00 ,  F16J15/02

CPC分类号： C09J7/0217 ,  B32B2307/546 ,  B32B2307/56 ,  B32B2307/71 ,  B32B2307/73 ,  B32B2405/00 ,  C09J7/21 ,  C09J7/385 ,  G03F7/70341 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/7095 ,  Y10T428/28 ,  Y10T428/2843 ,  Y10T428/2848 ,  Y10T428/2852

摘要： A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.

摘要翻译： 提供密封构件以防止浸入液体进入部件之间的间隙。 密封构件具有粘附到形成被密封的间隙的部件的塑料或聚合物密封部分。 密封构件被构造成减少被密封的部件之间的力耦合，特别是与时间有关的力耦合。