公开(公告)号：US07569488B2

公开(公告)日：2009-08-04

申请号：US11767430

申请日：2007-06-22

Applicant: Marjorio Rafanan

Inventor： Marjorio Rafanan

IPC: H01L21/302

CPC classification number: B81C1/00476 ,  B81C1/00801 ,  B81C99/0065 ,  B81C2201/0138

Abstract: Embodiments of the present invention relate to methods and systems for making a microelectromechanical system MEMS device comprising supplying an etchant to etch one or more sacrificial structures of the system in a chamber. A process parameter relating to the pressure within the chamber is monitored as a function of time to provide an indication of the extent of the etching of the one or more sacrificial structures.

Abstract translation: 本发明的实施例涉及用于制造微机电系统（MEMS）装置的方法和系统，包括提供蚀刻剂以蚀刻腔室中的系统的一个或多个牺牲结构。 作为时间的函数来监测与室内的压力相关的过程参数，以提供对一个或多个牺牲结构的蚀刻程度的指示。

公开(公告)号：US20080318344A1

公开(公告)日：2008-12-25

申请号：US11767430

申请日：2007-06-22

Applicant: Marjorio Rafanan

Inventor： Marjorio Rafanan

IPC: H01L21/465 ,  G06F19/00

CPC classification number: B81C1/00476 ,  B81C1/00801 ,  B81C99/0065 ,  B81C2201/0138

Abstract: Embodiments of the present invention relate to methods and systems for making a microelectromechanical system comprising supplying an etchant to etch one or more sacrificial structures of the system.

Abstract translation: 本发明的实施例涉及用于制造微机电系统的方法和系统，包括提供蚀刻剂以蚀刻系统的一个或多个牺牲结构。