-
公开(公告)号：US20090098491A1
公开(公告)日：2009-04-16
申请号：US12335714
申请日：2008-12-16
申请人： Mark A. Hackler , Anandkumar R. Kannurpatti , Robert A. McMillen , Wilford Shamlin , Arthur J. Taggi , Jeffrey Robert Lake , David B. Neufeglise , Siegfried R. Scheske
发明人： Mark A. Hackler , Anandkumar R. Kannurpatti , Robert A. McMillen , Wilford Shamlin , Arthur J. Taggi , Jeffrey Robert Lake , David B. Neufeglise , Siegfried R. Scheske
CPC分类号： G03F7/36
摘要： This invention pertains to a method and an apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for controlling vapor and condensate created during thermal treating of the photosensitive element.
摘要翻译： 本发明涉及一种用于热敏显影感光元件的方法和设备，特别涉及用于控制在感光元件的热处理过程中产生的蒸气和冷凝物的方法和设备。
-
2.发明授权Method for thermal development using apparatus having a removable support member 有权使用具有可拆卸支撑构件的装置进行热显影的方法公开(公告)号：US07611597B2
公开(公告)日：2009-11-03
申请号：US12077584
申请日：2008-03-20
申请人： Mark A Hackler , Dietmar Dudek , William W. Early , Anandkumar R. Kannurpatti , Jeffrey Robert Lake , Robert A. McMillen , David B. Neufeglise , Pier Luigi Sassanelli
发明人： Mark A Hackler , Dietmar Dudek , William W. Early , Anandkumar R. Kannurpatti , Jeffrey Robert Lake , Robert A. McMillen , David B. Neufeglise , Pier Luigi Sassanelli
IPC分类号： B32B37/00
CPC分类号： G03F7/36 , Y10T156/1741 , Y10T156/1744
摘要： This invention pertains to a method and apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for supporting the photosensitive element with a removable flexible support member during thermal treatment.
摘要翻译： 本发明涉及用于热敏显影感光元件的方法和装置，特别涉及用于在热处理期间用可移除的柔性支撑构件支撑感光元件的方法和装置。
-
3.发明申请Method and apparatus for thermal development having a removable support member 有权用于热显影的方法和装置，具有可拆卸的支撑构件公开(公告)号：US20080213706A1
公开(公告)日：2008-09-04
申请号：US12077584
申请日：2008-03-20
申请人： Mark A. Hackler , Dietmar Dudek , William W. Early , Anandkumar R. Kannurpatti , Jeffrey Robert Lake , Robert A. McMillen , David B. Neufeglise , Pier Luigi Sassanelli
发明人： Mark A. Hackler , Dietmar Dudek , William W. Early , Anandkumar R. Kannurpatti , Jeffrey Robert Lake , Robert A. McMillen , David B. Neufeglise , Pier Luigi Sassanelli
CPC分类号： G03F7/36 , Y10T156/1741 , Y10T156/1744
摘要： This invention pertains to a method and apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for supporting the photosensitive element with a removable flexible support member during thermal treatment.
摘要翻译： 本发明涉及用于热敏显影感光元件的方法和装置，特别涉及用于在热处理期间用可移动的柔性支撑构件支撑感光元件的方法和装置。
-
公开(公告)号：US07398812B2
公开(公告)日：2008-07-15
申请号：US11009679
申请日：2004-12-10
申请人： Mark A. Hackler , Dietmar Dudek , William W. Early , Anandkumar R. Kannurpatti , Jeffrey Robert Lake , Robert A. McMillen , David B. Neufeglise , Pier Luigi Sassanelli
发明人： Mark A. Hackler , Dietmar Dudek , William W. Early , Anandkumar R. Kannurpatti , Jeffrey Robert Lake , Robert A. McMillen , David B. Neufeglise , Pier Luigi Sassanelli
IPC分类号： B32B37/00
CPC分类号： G03F7/36 , Y10T156/1741 , Y10T156/1744
摘要： This invention pertains to a method and apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for supporting the photosensitive element with a removable flexible support member during thermal treatment.
摘要翻译： 本发明涉及用于热敏显影感光元件的方法和装置，特别涉及用于在热处理期间用可移除的柔性支撑构件支撑感光元件的方法和装置。
-
-
-
搜索结果
4 条记录 (耗时 0.035 秒)
